Processing of BiFeO3 thin films to control their dielectric response
| dc.contributor.author | Reis, S. P. [UNESP] | |
| dc.contributor.author | Freitas, F. E. [UNESP] | |
| dc.contributor.author | Araujo, E. B. [UNESP] | |
| dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
| dc.contributor.institution | Fed Inst Educ Sci & Technol Sao Paulo | |
| dc.contributor.institution | Univ Rio Verde UniRV | |
| dc.date.accessioned | 2020-12-10T20:00:45Z | |
| dc.date.available | 2020-12-10T20:00:45Z | |
| dc.date.issued | 2020-05-18 | |
| dc.description.abstract | BiFeO3 (BFO) thin films were studied to control their oxygen-related processing parameters in order to obtain specific electrical characteristics in terms of conductivity and dielectric relaxation. BFO thin films prepared with Fe and Bi excesses and post-annealed in oxygen atmosphere showed higher electrical conductivity and lower conduction activation energies than single phase ones. Distinct parameters indicated different conduction mechanisms in the films, associated with the first ionization of oxygen vacancies in BFO films with Fe and Bi excesses and the second one in single phase films. Higher conductive films show lower relaxation times compared to single phase ones. | en |
| dc.description.affiliation | Sao Paulo State Univ, Dept Phys & Chem, Ilha Solteira, Brazil | |
| dc.description.affiliation | Fed Inst Educ Sci & Technol Sao Paulo, Votuporanga, Brazil | |
| dc.description.affiliation | Univ Rio Verde UniRV, Rio Verde, Brazil | |
| dc.description.affiliationUnesp | Sao Paulo State Univ, Dept Phys & Chem, Ilha Solteira, Brazil | |
| dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
| dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
| dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | |
| dc.description.sponsorshipId | FAPESP: 2017/13769-1 | |
| dc.description.sponsorshipId | CNPq: 304604/2015-1 | |
| dc.description.sponsorshipId | CAPES: 88887.310512/2018-00 | |
| dc.format.extent | 61-69 | |
| dc.identifier | http://dx.doi.org/10.1080/00150193.2020.1722884 | |
| dc.identifier.citation | Ferroelectrics. Abingdon: Taylor & Francis Ltd, v. 560, n. 1, p. 61-69, 2020. | |
| dc.identifier.doi | 10.1080/00150193.2020.1722884 | |
| dc.identifier.issn | 0015-0193 | |
| dc.identifier.uri | http://hdl.handle.net/11449/196929 | |
| dc.identifier.wos | WOS:000536970900010 | |
| dc.language.iso | eng | |
| dc.publisher | Taylor & Francis Ltd | |
| dc.relation.ispartof | Ferroelectrics | |
| dc.source | Web of Science | |
| dc.subject | Conductivity | |
| dc.subject | dielectric relaxation | |
| dc.subject | bismuth ferrite | |
| dc.subject | thin films | |
| dc.title | Processing of BiFeO3 thin films to control their dielectric response | en |
| dc.type | Artigo | |
| dcterms.license | http://journalauthors.tandf.co.uk/permissions/reusingOwnWork.asp | |
| dcterms.rightsHolder | Taylor & Francis Ltd | |
| dspace.entity.type | Publication | |
| unesp.department | Física e Química - FEIS | pt |
