Publicação: Ferroelectric and dielectric properties of Ba0.5Sr0.5(Ti0.80Sn0.20)O-3 thin films grown by the soft chemical method
dc.contributor.author | Souza, I. A. | |
dc.contributor.author | Simoes, A. Z. | |
dc.contributor.author | Cava, S. | |
dc.contributor.author | Cavalcante, L. S. | |
dc.contributor.author | Cilense, M. | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Univ Estadual Ponta Grossa | |
dc.contributor.institution | Universidade Federal de São Carlos (UFSCar) | |
dc.date.accessioned | 2014-05-20T14:17:59Z | |
dc.date.available | 2014-05-20T14:17:59Z | |
dc.date.issued | 2006-10-01 | |
dc.description.abstract | Polycrystalline Ba0.5Sr0.5(Ti0.80Sn0.20)O-3 (BST:Sn) thin films with a perovskite structure were prepared by the soft chemical method on a platinum-coated silicon substrate from spin-coating technique. The resulting thin films showed a dense structure with uniform grain size distribution. The dielectric constant of the films estimated from C-V curve is around 1134 and can be ascribed to a reduction in the oxygen vacancy concentration. The ferroelectric nature of the film indicated by butterfly-shaped C-V curves and confirmed by the hysteresis curve, showed remnant polarization of 14 mu C/cm(2) and coercive field of 74 kV/cm at frequency of 1 MHz. At the same frequency, the leakage current density at 1.0 V is equal to 1.5 x 10(-7) A/cm(2). This work clearly reveals the highly promising potential of BST:Sn for application in memory devices. (c) 2006 Elsevier B.V. All rights reserved. | en |
dc.description.affiliation | Univ Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801970 Araraquara, SP, Brazil | |
dc.description.affiliation | Univ Estadual Ponta Grossa, Ctr Interdisciplinar Pesquisa & Posgrad, Lab Interdisciplinar Mat Ceram, BR-84035900 Ponta Grossa, PR, Brazil | |
dc.description.affiliation | Univ Fed Sao Carlos, Dept Quim, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 Sao Carlos, SP, Brazil | |
dc.description.affiliationUnesp | Univ Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801970 Araraquara, SP, Brazil | |
dc.format.extent | 2972-2976 | |
dc.identifier | http://dx.doi.org/10.1016/j.jssc.2006.06.023 | |
dc.identifier.citation | Journal of Solid State Chemistry. San Diego: Academic Press Inc. Elsevier B.V., v. 179, n. 10, p. 2972-2976, 2006. | |
dc.identifier.doi | 10.1016/j.jssc.2006.06.023 | |
dc.identifier.issn | 0022-4596 | |
dc.identifier.lattes | 9128353103083394 | |
dc.identifier.uri | http://hdl.handle.net/11449/25404 | |
dc.identifier.wos | WOS:000240638100002 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. | |
dc.relation.ispartof | Journal of Solid State Chemistry | |
dc.relation.ispartofjcr | 2.179 | |
dc.relation.ispartofsjr | 0,632 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | crystallization | pt |
dc.subject | film deposition | pt |
dc.subject | space charge effects | pt |
dc.subject | thin films | pt |
dc.title | Ferroelectric and dielectric properties of Ba0.5Sr0.5(Ti0.80Sn0.20)O-3 thin films grown by the soft chemical method | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. | |
dspace.entity.type | Publication | |
unesp.author.lattes | 9128353103083394 | |
unesp.author.lattes | 3573363486614904[2] | |
unesp.author.orcid | 0000-0003-2535-2187[2] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Físico-Química - IQAR | pt |
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