New approach for removing the self-heating from MOSFET current using only DC characteristics
| dc.contributor.author | Mori, C. A. B. | |
| dc.contributor.author | Agopian, P. G. D. [UNESP] | |
| dc.contributor.author | Martino, J. A. | |
| dc.contributor.author | IEEE | |
| dc.contributor.institution | Universidade de São Paulo (USP) | |
| dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
| dc.date.accessioned | 2019-10-04T19:12:11Z | |
| dc.date.available | 2019-10-04T19:12:11Z | |
| dc.date.issued | 2018-01-01 | |
| dc.description.abstract | In this paper we report a new technique for removing the self-heating from the DC output characteristics of a MOSFET. In this method, the self-heating is eliminated from the drain current through a mathematical procedure, allowing a direct comparison of the curves with and without self-heating. We developed an analytical model considering the temperature increase in the channel of devices due to self-heating which causes the mobility degradation. To apply this technique, the inverse transistor efficiency method was employed to obtain the thermal resistance (using only DC measurements) and the temperature mobility degradation factor. In the worst case for tridimensional simulations of Silicon-On-Insulator FinFET devices, we obtained an error of 3.6% between the drain current with the self-heating eliminated through our method and the current without self heating. Additionally, when we applied the method to devices without self-heating, the drain current presented no changes, showing that the method can determine if a device is self-heating free or not. | en |
| dc.description.affiliation | Univ Sao Paulo, PSI, LSI, Sao Paulo, Brazil | |
| dc.description.affiliation | Sao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil | |
| dc.description.affiliationUnesp | Sao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil | |
| dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
| dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
| dc.format.extent | 3 | |
| dc.identifier.citation | 2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s). New York: Ieee, 3 p., 2018. | |
| dc.identifier.issn | 2573-5926 | |
| dc.identifier.uri | http://hdl.handle.net/11449/186353 | |
| dc.identifier.wos | WOS:000462960700051 | |
| dc.language.iso | eng | |
| dc.publisher | Ieee | |
| dc.relation.ispartof | 2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s) | |
| dc.rights.accessRights | Acesso aberto | pt |
| dc.source | Web of Science | |
| dc.subject | self-heating effect | |
| dc.subject | Silicon-On-Insulator | |
| dc.subject | FinFET | |
| dc.title | New approach for removing the self-heating from MOSFET current using only DC characteristics | en |
| dc.type | Trabalho apresentado em evento | pt |
| dcterms.license | http://www.ieee.org/publications_standards/publications/rights/rights_policies.html | |
| dcterms.rightsHolder | Ieee | |
| dspace.entity.type | Publication | |
| relation.isOrgUnitOfPublication | 72ed3d55-d59c-4320-9eee-197fc0095136 | |
| relation.isOrgUnitOfPublication.latestForDiscovery | 72ed3d55-d59c-4320-9eee-197fc0095136 | |
| unesp.campus | Universidade Estadual Paulista (UNESP), Faculdade de Engenharia, São João da Boa Vista | pt |

