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New approach for removing the self-heating from MOSFET current using only DC characteristics

dc.contributor.authorMori, C. A. B.
dc.contributor.authorAgopian, P. G. D. [UNESP]
dc.contributor.authorMartino, J. A.
dc.contributor.authorIEEE
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2019-10-04T19:12:11Z
dc.date.available2019-10-04T19:12:11Z
dc.date.issued2018-01-01
dc.description.abstractIn this paper we report a new technique for removing the self-heating from the DC output characteristics of a MOSFET. In this method, the self-heating is eliminated from the drain current through a mathematical procedure, allowing a direct comparison of the curves with and without self-heating. We developed an analytical model considering the temperature increase in the channel of devices due to self-heating which causes the mobility degradation. To apply this technique, the inverse transistor efficiency method was employed to obtain the thermal resistance (using only DC measurements) and the temperature mobility degradation factor. In the worst case for tridimensional simulations of Silicon-On-Insulator FinFET devices, we obtained an error of 3.6% between the drain current with the self-heating eliminated through our method and the current without self heating. Additionally, when we applied the method to devices without self-heating, the drain current presented no changes, showing that the method can determine if a device is self-heating free or not.en
dc.description.affiliationUniv Sao Paulo, PSI, LSI, Sao Paulo, Brazil
dc.description.affiliationSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil
dc.description.affiliationUnespSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.format.extent3
dc.identifier.citation2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s). New York: Ieee, 3 p., 2018.
dc.identifier.issn2573-5926
dc.identifier.urihttp://hdl.handle.net/11449/186353
dc.identifier.wosWOS:000462960700051
dc.language.isoeng
dc.publisherIeee
dc.relation.ispartof2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s)
dc.rights.accessRightsAcesso abertopt
dc.sourceWeb of Science
dc.subjectself-heating effect
dc.subjectSilicon-On-Insulator
dc.subjectFinFET
dc.titleNew approach for removing the self-heating from MOSFET current using only DC characteristicsen
dc.typeTrabalho apresentado em eventopt
dcterms.licensehttp://www.ieee.org/publications_standards/publications/rights/rights_policies.html
dcterms.rightsHolderIeee
dspace.entity.typePublication
relation.isOrgUnitOfPublication72ed3d55-d59c-4320-9eee-197fc0095136
relation.isOrgUnitOfPublication.latestForDiscovery72ed3d55-d59c-4320-9eee-197fc0095136
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, São João da Boa Vistapt

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