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Synthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor method

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorRamirez, M. A.
dc.contributor.authorRiccardi, C. S.
dc.contributor.authorGonzalez, AHM
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-20T15:28:32Z
dc.date.available2014-05-20T15:28:32Z
dc.date.issued2006-08-01
dc.description.abstractWe report the successful deposition of CaBi2Nb2O9 (CBN) thin films on platinum coated silicon substrates by polymeric precursor method. The CBN thin films exhibited good structural, dielectric and CBN/Pt interface characteristics. The leakage current of the capacitor structure was around 0.15 A cm(-2) at an applied electric field of 30 kV cm(-1). The capacitance-voltage measurements indicated good ferroelectric polarization switching characteristics. The typical measured small signal dielectric constant and the dissipation factor at a frequency of 100 kHz were 90 and 0.053, respectively. The remanent polarization and the drive voltage values were 4.2 C cm(-2) and 1.7 V at an applied voltage of 10 V. No significant fatigue was observed at least up to 10(8) switching cycles. (c) 2005 Elsevier B.V. All rights reserved.en
dc.description.affiliationPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationFed Univ Sao Carlos, Chem Dept, UFSCar, BR-13560905 Sao Carlos, SP, Brazil
dc.description.affiliationUnespPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil
dc.format.extent203-206
dc.identifierhttp://dx.doi.org/10.1016/j.matchemphys.2005.09.004
dc.identifier.citationMaterials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 98, n. 2-3, p. 203-206, 2006.
dc.identifier.dimensionspub.1030705509
dc.identifier.doi10.1016/j.matchemphys.2005.09.004
dc.identifier.issn0254-0584
dc.identifier.issn1879-3312
dc.identifier.orcid0000-0003-2535-2187
dc.identifier.orcid0000-0003-2982-8736
dc.identifier.orcid0000-0003-0415-2944
dc.identifier.orcid0000-0002-2681-1579
dc.identifier.orcid0000-0001-8062-7791
dc.identifier.urihttp://hdl.handle.net/11449/38329
dc.identifier.wosWOS:000238298100004
dc.language.isoeng
dc.publisherElsevier B.V.
dc.publisherElsevier
dc.relation.ispartofMaterials Chemistry and Physics
dc.relation.ispartofjcr2.210
dc.relation.ispartofsjr0,615
dc.rights.accessRightsAcesso restritopt
dc.sourceWeb of Science
dc.sourceDimensions
dc.subjectthin filmspt
dc.subjectannealingpt
dc.subjectelectrical propertiespt
dc.titleSynthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor methoden
dc.typeArtigopt
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
relation.isOrgUnitOfPublicationbc74a1ce-4c4c-4dad-8378-83962d76c4fd
relation.isOrgUnitOfPublication.latestForDiscoverybc74a1ce-4c4c-4dad-8378-83962d76c4fd
unesp.author.lattes3573363486614904[1]
unesp.author.lattes0173401604473200[3]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.author.orcid0000-0003-2192-5312[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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