Publicação: Synthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor method
dc.contributor.author | Simoes, A. Z. | |
dc.contributor.author | Ramirez, M. A. | |
dc.contributor.author | Riccardi, C. S. | |
dc.contributor.author | Gonzalez, AHM | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Universidade Federal de São Carlos (UFSCar) | |
dc.date.accessioned | 2014-05-20T15:28:32Z | |
dc.date.available | 2014-05-20T15:28:32Z | |
dc.date.issued | 2006-08-01 | |
dc.description.abstract | We report the successful deposition of CaBi2Nb2O9 (CBN) thin films on platinum coated silicon substrates by polymeric precursor method. The CBN thin films exhibited good structural, dielectric and CBN/Pt interface characteristics. The leakage current of the capacitor structure was around 0.15 A cm(-2) at an applied electric field of 30 kV cm(-1). The capacitance-voltage measurements indicated good ferroelectric polarization switching characteristics. The typical measured small signal dielectric constant and the dissipation factor at a frequency of 100 kHz were 90 and 0.053, respectively. The remanent polarization and the drive voltage values were 4.2 C cm(-2) and 1.7 V at an applied voltage of 10 V. No significant fatigue was observed at least up to 10(8) switching cycles. (c) 2005 Elsevier B.V. All rights reserved. | en |
dc.description.affiliation | Paulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil | |
dc.description.affiliation | Fed Univ Sao Carlos, Chem Dept, UFSCar, BR-13560905 Sao Carlos, SP, Brazil | |
dc.description.affiliationUnesp | Paulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil | |
dc.format.extent | 203-206 | |
dc.identifier | http://dx.doi.org/10.1016/j.matchemphys.2005.09.004 | |
dc.identifier.citation | Materials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 98, n. 2-3, p. 203-206, 2006. | |
dc.identifier.doi | 10.1016/j.matchemphys.2005.09.004 | |
dc.identifier.issn | 0254-0584 | |
dc.identifier.uri | http://hdl.handle.net/11449/38329 | |
dc.identifier.wos | WOS:000238298100004 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. | |
dc.relation.ispartof | Materials Chemistry and Physics | |
dc.relation.ispartofjcr | 2.210 | |
dc.relation.ispartofsjr | 0,615 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | thin films | pt |
dc.subject | annealing | pt |
dc.subject | electrical properties | pt |
dc.title | Synthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor method | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. | |
dspace.entity.type | Publication | |
unesp.author.lattes | 3573363486614904[1] | |
unesp.author.lattes | 0173401604473200[3] | |
unesp.author.orcid | 0000-0003-2535-2187[1] | |
unesp.author.orcid | 0000-0003-2192-5312[3] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Bioquímica e Tecnologia - IQAR | pt |
unesp.department | Físico-Química - IQAR | pt |
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