Publicação:
Synthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor method

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorRamirez, M. A.
dc.contributor.authorRiccardi, C. S.
dc.contributor.authorGonzalez, AHM
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-20T15:28:32Z
dc.date.available2014-05-20T15:28:32Z
dc.date.issued2006-08-01
dc.description.abstractWe report the successful deposition of CaBi2Nb2O9 (CBN) thin films on platinum coated silicon substrates by polymeric precursor method. The CBN thin films exhibited good structural, dielectric and CBN/Pt interface characteristics. The leakage current of the capacitor structure was around 0.15 A cm(-2) at an applied electric field of 30 kV cm(-1). The capacitance-voltage measurements indicated good ferroelectric polarization switching characteristics. The typical measured small signal dielectric constant and the dissipation factor at a frequency of 100 kHz were 90 and 0.053, respectively. The remanent polarization and the drive voltage values were 4.2 C cm(-2) and 1.7 V at an applied voltage of 10 V. No significant fatigue was observed at least up to 10(8) switching cycles. (c) 2005 Elsevier B.V. All rights reserved.en
dc.description.affiliationPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationFed Univ Sao Carlos, Chem Dept, UFSCar, BR-13560905 Sao Carlos, SP, Brazil
dc.description.affiliationUnespPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil
dc.format.extent203-206
dc.identifierhttp://dx.doi.org/10.1016/j.matchemphys.2005.09.004
dc.identifier.citationMaterials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 98, n. 2-3, p. 203-206, 2006.
dc.identifier.doi10.1016/j.matchemphys.2005.09.004
dc.identifier.issn0254-0584
dc.identifier.urihttp://hdl.handle.net/11449/38329
dc.identifier.wosWOS:000238298100004
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofMaterials Chemistry and Physics
dc.relation.ispartofjcr2.210
dc.relation.ispartofsjr0,615
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectthin filmspt
dc.subjectannealingpt
dc.subjectelectrical propertiespt
dc.titleSynthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor methoden
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes3573363486614904[1]
unesp.author.lattes0173401604473200[3]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.author.orcid0000-0003-2192-5312[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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