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Nanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrate

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dc.contributor.authorVieira, R. A.
dc.contributor.authorNono, MCA
dc.contributor.authorCruz, N. C.
dc.contributor.institutionInstituto Nacional de Pesquisas Espaciais (INPE)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T13:27:37Z
dc.date.available2014-05-20T13:27:37Z
dc.date.issued2002-07-01
dc.description.abstractThe results of nanohardness measurements at a film surface and film-substrate interface are presented and discussed. An electron beam device was used to deposit a Ti film on a 304 stainless steel (304 SS) substrate. The diluted interface was obtained by thermal activated atomic diffusion. The. Ti film and Ti film-304 SS interface were analyzed by energy dispersive spectrometry and were observed using atomic force microscopy. The nanohardness of the Ti film-304 SS system was measured by a nanoindentation technique. The results showed the Ti film-304 SS interface had a higher hardness value than the Ti film and 304 SS substrate. The Ti film surface had a lower hardness due to the presence of a TiO2 thin layer.en
dc.description.affiliationNatl Inst Space Res, INPE, Associated Lab Sensors & Mat, LAS, Sao Jose Dos Campos, Brazil
dc.description.affiliationUNESP, FEG, Dept Chem & Phys, DFQ, Guaratingueta, SP, Brazil
dc.description.affiliationUnespUNESP, FEG, Dept Chem & Phys, DFQ, Guaratingueta, SP, Brazil
dc.format.extent116-120
dc.identifierhttp://dx.doi.org/10.1002/1521-3951(200207)232:1<116
dc.identifier.citationPhysica Status Solidi B-basic Research. Weinheim: Wiley-v C H Verlag Gmbh, v. 232, n. 1, p. 116-120, 2002.
dc.identifier.doi10.1002/1521-3951(200207)232:1<116
dc.identifier.issn0370-1972
dc.identifier.urihttp://hdl.handle.net/11449/9137
dc.identifier.wosWOS:000177304400023
dc.language.isoeng
dc.publisherWiley-Blackwell
dc.relation.ispartofPhysica Status Solidi B: Basic Research
dc.relation.ispartofjcr1.729
dc.relation.ispartofsjr0,602
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.titleNanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrateen
dc.typeArtigo
dcterms.licensehttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dcterms.rightsHolderWiley-Blackwell
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Guaratinguetápt
unesp.departmentFísica e Química - FEGpt

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Guaratinguetá - FEG - Faculdade de Engenharia e Ciências