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Nanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrate

dc.contributor.authorVieira, R. A.
dc.contributor.authorNono, M. C.A.
dc.contributor.authorCruz, N. C. [UNESP]
dc.contributor.institutionNational Institute for Space Research (INPE)
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.date.accessioned2022-04-28T19:55:30Z
dc.date.available2022-04-28T19:55:30Z
dc.date.issued2002-08-15
dc.description.abstractThe results of nanohardness measurements at a film surface and film-substrate interface are presented and discussed. An electron beam device was used to deposit a Ti film on a 304 stainless steel (304 SS) substrate. The diluted interface was obtained by thermal activated atomic diffusion. The Ti film and Ti film-304 SS interface were analyzed by energy dispersive spectrometry and were observed using atomic force microscopy. The nanohardness of the Ti film-304 SS system was measured by a nanoindentation technique. The results showed the Ti film-304 SS interface had a higher hardness value than the Ti film and 304 SS substrate. The Ti film surface had a lower hardness due to the presence of a TiO2 thin layer.en
dc.description.affiliationAssociated Laboratory for Sensors and Materials (LAS) National Institute for Space Research (INPE), Sao Jose dos Campos, SP
dc.description.affiliationPhysics and Chemistry Department (DFQ) FEG-UNESP, Guaratinguetá, SP
dc.description.affiliationUnespPhysics and Chemistry Department (DFQ) FEG-UNESP, Guaratinguetá, SP
dc.format.extent116-120
dc.identifierhttp://dx.doi.org/10.1002/1521-3951(200207)232:1<116
dc.identifier.citationPhysica Status Solidi (B) Basic Research, v. 232, n. 1, p. 116-120, 2002.
dc.identifier.doi10.1002/1521-3951(200207)232:1<116
dc.identifier.issn0370-1972
dc.identifier.scopus2-s2.0-0036336077
dc.identifier.urihttp://hdl.handle.net/11449/224251
dc.language.isoeng
dc.relation.ispartofPhysica Status Solidi (B) Basic Research
dc.sourceScopus
dc.titleNanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrateen
dc.typeTrabalho apresentado em evento
dspace.entity.typePublication
unesp.departmentFísica e Química - FEGpt

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