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Development of amorphous carbon protective coatings on poly(vinyl)chloride

dc.contributor.authorRangel, Elidiane C. [UNESP]
dc.contributor.authorde Souza, Eduardo S. [UNESP]
dc.contributor.authorde Moraes, Francine S. [UNESP]
dc.contributor.authorMarins, Nazir M. S. [UNESP]
dc.contributor.authorSchreiner, Wido H.
dc.contributor.authorCruz, Nilson C. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal do Paraná (UFPR)
dc.date.accessioned2014-05-20T13:27:45Z
dc.date.available2014-05-20T13:27:45Z
dc.date.issued2010-03-01
dc.description.abstractThe great versatility of polymers has promoted their application in a series of ordinary situations. The development of specific devices from polymers, however, requires modifications to fit specific stipulations. In this work the surface properties of thin films grown onto polyvinylchloride (PVC) were investigated. Hydrogenated amorphous carbon films were deposited onto commercial PVC plates from acetylene and argon plasmas excited by radiofrequency (13.56 MHz, 70 W) power. The proportion of acetylene in the gas feed was varied against that of argon, keeping the total pressure constant at 2.5 Pa. Deposition time was 1800 s. Film elemental composition was analyzed by X-ray photoelectron spectroscopy, XPS. Water contact angle measurements were performed using the sessile drop technique. The root mean squared roughness was derived from 50 x 50 mu m(2) surface topographic images, acquired by scanning probe microscopy. Nanoindentation and pin-on-disk techniques were employed on the determination of film hardness and sliding wear, respectively. Oxidation resistance was obtained through the etching rate of the samples in oxygen radiofrequency (1.3 Pa, SOW) plasmas. From XPS analysis it was detected oxygen and nitrogen contamination in all the samples. It was also found that sp(3)/sp(2) ratio depends on the proportion of argon in the plasma. At lower argon concentrations, hardness, wear and oxidation resistances were all improved with respect to the uncoated PVC. In such conditions, the surface wettability is low indicating a moderate receptivity to water. This combination of properties, ascribed to a balance between the ion bombardment and deposition processes, is suitable for materials exposed to rigorous weathering conditions. (C) 2009 Elsevier B.V. All rights reserved.en
dc.description.affiliationUNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUNESP, Dept Quim & Fis, Lab Plasmas, BR-12516410 Guaratingueta, SP, Brazil
dc.description.affiliationUniversidade Federal do Paraná (UFPR), Dept Fis, Lab Superficies & Interfaces, BR-81531900 Curitiba, Parana, Brazil
dc.description.affiliationUnespUNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUnespUNESP, Dept Quim & Fis, Lab Plasmas, BR-12516410 Guaratingueta, SP, Brazil
dc.description.sponsorshipFundação para o Desenvolvimento da UNESP (FUNDUNESP)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.format.extent2750-2756
dc.identifierhttp://dx.doi.org/10.1016/j.tsf.2009.11.087
dc.identifier.citationThin Solid Films. Lausanne: Elsevier B.V. Sa, v. 518, n. 10, p. 2750-2756, 2010.
dc.identifier.doi10.1016/j.tsf.2009.11.087
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/11449/9194
dc.identifier.wosWOS:000275920000029
dc.language.isoeng
dc.publisherElsevier B.V. Sa
dc.relation.ispartofThin Solid Films
dc.relation.ispartofjcr1.939
dc.relation.ispartofsjr0,617
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectPlasma-enhanced chemical vapor depositionen
dc.subjectHardnessen
dc.subjectWettabilityen
dc.subjectOxidationen
dc.subjectPolyvinylchlorideen
dc.subjecta-C:Hen
dc.subjectAtomic force microscopyen
dc.subjectX-ray photoelection spectroscopyen
dc.titleDevelopment of amorphous carbon protective coatings on poly(vinyl)chlorideen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V. Sa
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Guaratinguetápt
unesp.departmentFísica e Química - FEGpt

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