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Corrosion behavior of Ti-6Al-4V alloy treated by plasma immersion ion implantation process

dc.contributor.authorda Silva, L. L. G.
dc.contributor.authorUeda, M.
dc.contributor.authorSilva, M. M.
dc.contributor.authorCodaro, E. N.
dc.contributor.institutionInstituto Nacional de Pesquisas Espaciais (INPE)
dc.contributor.institutionITA
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T13:27:36Z
dc.date.available2014-05-20T13:27:36Z
dc.date.issued2007-08-05
dc.description.abstractTi-6Al-4V alloy is one of the most frequently used Ti alloys with diverse applications in aerospace and biomedical areas due to its favorable mechanical properties, corrosion resistance and biocompatibility. Meanwhile, its surface can stiffer intense corrosion caused by wear processes due to its poor tribological properties. Thus in the present study, PIII processing of Ti-6Al-4V alloy was carried out to evaluate its corrosion resistance in 3.5% NaCl solution. Two different sets of Ti-6Al-4V samples were PIII treated, varying the plasma gases and the treatment time. The corrosion behavior is correlated with the surface morphology, and the nitrogen content. SEM micrographs of the untreated sample reveal a typical two-phase structure. PIII processing promotes surface sputtering and the surface morphology is completely different for samples treated with N-2/H-2 mixture and N-2 only. The highest penetration of nitrogen (similar to 88 nm), corresponding to 33% of N-2 was obtained for the sample treated with N-2/H-2 mixture for 1:30 h. The corrosion behavior of the samples was investigated by a potentiodynamic polarization method. A large passive region of the polarization curves (similar to 1.5 V), associated with the formation of a protective film, was observed for all samples. The passive current density (similar to 3 x 10(-6) A cm(-2)) of the PIII-treated Ti-6Al-4V samples is about 10 times higher than for the untreated sample. This current value is still rather low and maintains good corrosion resistance. The anodic branches of the polarization curves for all treated Ti-6Al-4V samples demonstrate also that the oxide films break down at approximately 1.6 V, forming an active region. Although the sample treated by N-2/H-2 mixture for 1.30 It has thicker nitrogen enriched layer, better corrosion resistance is obtained for the PIII process performed with N, gas only. (c) 2007 Elsevier B.V. All rights reserved.en
dc.description.affiliationNatl Inst Space Res, Associação Plasma Lab, Sao Jose Dos Campos, SP, Brazil
dc.description.affiliationITA, Dept Mech Engn, Sao Jose Dos Campos, SP, Brazil
dc.description.affiliationSão Paulo State Univ, UNESP, Dept Chem & Phys, BR-12516410 Guaratingueta, SP, Brazil
dc.description.affiliationUnespSão Paulo State Univ, UNESP, Dept Chem & Phys, BR-12516410 Guaratingueta, SP, Brazil
dc.format.extent8136-8139
dc.identifierhttp://dx.doi.org/10.1016/j.surfcoat.2006.03.054
dc.identifier.citationSurface & Coatings Technology. Lausanne: Elsevier B.V. Sa, v. 201, n. 19-20, p. 8136-8139, 2007.
dc.identifier.doi10.1016/j.surfcoat.2006.03.054
dc.identifier.issn0257-8972
dc.identifier.lattes7539097260489375
dc.identifier.urihttp://hdl.handle.net/11449/9123
dc.identifier.wosWOS:000249034000028
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofSurface & Coatings Technology
dc.relation.ispartofjcr2.906
dc.relation.ispartofsjr0,928
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectTi-6Al-4V alloypt
dc.subjectplasma immersion ion implantationpt
dc.subjectcorrosionpt
dc.subjectnitride layerpt
dc.titleCorrosion behavior of Ti-6Al-4V alloy treated by plasma immersion ion implantation processen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes7539097260489375
unesp.author.orcid0000-0002-1648-2281[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Guaratinguetápt
unesp.departmentFísica e Química - FEGpt

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