Publicação: Impact of defects on the electrical properties of BiFeO3 thin films
| dc.contributor.author | Reis, S. P. [UNESP] | |
| dc.contributor.author | Araujo, E. B. [UNESP] | |
| dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
| dc.contributor.institution | Fed Inst Educ Sci & Technol Sao Paulo | |
| dc.date.accessioned | 2020-12-10T19:56:02Z | |
| dc.date.available | 2020-12-10T19:56:02Z | |
| dc.date.issued | 2020-02-17 | |
| dc.description.abstract | The impact of defects on the electrical properties of bismuth ferrite thin films has been studied. Secondary phases and oxygen vacancies were the main defects considered. Thin films with secondary phases show higher conductivities than single-phase films. Monophasic films annealed in oxygen atmosphere shows lower conductivity than the non-annealed film. For selected thin film with secondary phase, the relaxation in the grain boundary was predominant with activation energy eV, suggesting the first ionization oxygen vacancies as the relaxation mechanism in the studied films. The electric field effect on relaxation processes was similarly to Arrhenius thermally activated process. | en |
| dc.description.affiliation | Sao Paulo State Univ, Dept Phys & Chem, Ilha Solteira, Brazil | |
| dc.description.affiliation | Fed Inst Educ Sci & Technol Sao Paulo, Votuporanga, Brazil | |
| dc.description.affiliationUnesp | Sao Paulo State Univ, Dept Phys & Chem, Ilha Solteira, Brazil | |
| dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
| dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
| dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | |
| dc.description.sponsorshipId | FAPESP: 2017/13769-1 | |
| dc.description.sponsorshipId | CNPq: 304604/2015-1 | |
| dc.format.extent | 70-78 | |
| dc.identifier | http://dx.doi.org/10.1080/00150193.2020.1713344 | |
| dc.identifier.citation | Ferroelectrics. Abingdon: Taylor & Francis Ltd, v. 556, n. 1, p. 70-78, 2020. | |
| dc.identifier.doi | 10.1080/00150193.2020.1713344 | |
| dc.identifier.issn | 0015-0193 | |
| dc.identifier.uri | http://hdl.handle.net/11449/196782 | |
| dc.identifier.wos | WOS:000526426500011 | |
| dc.language.iso | eng | |
| dc.publisher | Taylor & Francis Ltd | |
| dc.relation.ispartof | Ferroelectrics | |
| dc.source | Web of Science | |
| dc.subject | Defects | |
| dc.subject | bismuth ferrite | |
| dc.subject | thin films | |
| dc.title | Impact of defects on the electrical properties of BiFeO3 thin films | en |
| dc.type | Artigo | |
| dcterms.license | http://journalauthors.tandf.co.uk/permissions/reusingOwnWork.asp | |
| dcterms.rightsHolder | Taylor & Francis Ltd | |
| dspace.entity.type | Publication | |
| unesp.department | Física e Química - FEIS | pt |