Logotipo do repositório
 

Publicação:
Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

dc.contributor.authorChiappim, William [UNESP]
dc.contributor.authorNeto, Benedito Botan
dc.contributor.authorShiotani, Michaela
dc.contributor.authorKarnopp, Júlia
dc.contributor.authorGonçalves, Luan
dc.contributor.authorChaves, João Pedro
dc.contributor.authorSobrinho, Argemiro da Silva
dc.contributor.authorLeitão, Joaquim Pratas
dc.contributor.authorFraga, Mariana
dc.contributor.authorPessoa, Rodrigo
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionInstituto Tecnológico de Aeronáutica
dc.contributor.institutionUniversidade de Aveiro
dc.contributor.institutionUniversidade Presbiteriana Mackenzie
dc.date.accessioned2023-07-29T12:31:19Z
dc.date.available2023-07-29T12:31:19Z
dc.date.issued2022-10-01
dc.description.abstractThe growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques. In the past few years, the development and recent advances in atomic layer deposition (ALD) processes boosted interest in their use in advanced electronic and nano/microelectromechanical systems (NEMS/MEMS) device manufacturing. In this context, non-thermal plasma (NTP) technology has been highlighted because it allowed the ALD technique to expand its process window and the fabrication of several nanomaterials at reduced temperatures, allowing thermosensitive substrates to be covered with good formability and uniformity. In this review article, we comprehensively describe how the NTP changed the ALD universe and expanded it in device fabrication for different applications. We also present an overview of the efforts and developed strategies to gather the NTP and ALD technologies with the consecutive formation of plasma-assisted ALD (PA-ALD) technique, which has been successfully applied in nanofabrication and surface modification. The advantages and limitations currently faced by this technique are presented and discussed. We conclude this review by showing the atomic layer etching (ALE) technique, another development of NTP and ALD junction that has gained more and more attention by allowing significant advancements in plasma-assisted nanofabrication.en
dc.description.affiliationDepartamento de Física Laboratório de Plasmas e Aplicações Faculdade de Engenharia e Ciências Universidade Estadual Paulista (UNESP), Av. Ariberto Pereira da Cunha, 333-Portal das Colinas, SP
dc.description.affiliationDepartamento de Física Laboratório de Plasmas e Processos Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, SP
dc.description.affiliationDepartamento de Física I3N Universidade de Aveiro
dc.description.affiliationEscola de Engenharia Universidade Presbiteriana Mackenzie, SP
dc.description.affiliationUnespDepartamento de Física Laboratório de Plasmas e Aplicações Faculdade de Engenharia e Ciências Universidade Estadual Paulista (UNESP), Av. Ariberto Pereira da Cunha, 333-Portal das Colinas, SP
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipIdFAPESP: 20/10450-7
dc.description.sponsorshipIdFAPESP: 21/03620-6
dc.description.sponsorshipIdCNPq: 437921/2018-2
dc.description.sponsorshipIdCNPq: 446545/2014-7
dc.identifierhttp://dx.doi.org/10.3390/nano12193497
dc.identifier.citationNanomaterials, v. 12, n. 19, 2022.
dc.identifier.doi10.3390/nano12193497
dc.identifier.issn2079-4991
dc.identifier.scopus2-s2.0-85139960372
dc.identifier.urihttp://hdl.handle.net/11449/246087
dc.language.isoeng
dc.relation.ispartofNanomaterials
dc.sourceScopus
dc.subjectALD
dc.subjectnon-thermal plasma
dc.subjectplasma-assisted atomic layer deposition
dc.subjectplasma-atomic layer etching
dc.subjectplasma-enhanced atomic layer deposition
dc.subjectradical-enhanced atomic layer deposition
dc.subjectthin-film
dc.titlePlasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etchingen
dc.typeResenhapt
dspace.entity.typePublication
unesp.author.orcid0000-0003-2615-2216[1]
unesp.author.orcid0000-0002-1498-988X[2]
unesp.author.orcid0000-0002-8694-7697[4]
unesp.author.orcid0000-0001-7227-9176[7]
unesp.author.orcid0000-0001-8131-3313[8]
unesp.author.orcid0000-0001-6976-8550[9]
unesp.author.orcid0000-0001-7600-9747[10]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia e Ciências, Guaratinguetápt

Arquivos