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Structure and growth mechanism of CuO plates obtained by microwave-hydrothermal without surfactants

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dc.contributor.authorMoura, A. P.
dc.contributor.authorCavalcante, L. S. [UNESP]
dc.contributor.authorSczancoski, J. C.
dc.contributor.authorStroppa, D. G.
dc.contributor.authorParis, E. C.
dc.contributor.authorRamirez, A. J.
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionLab Nacl Luz Sincrotron
dc.date.accessioned2014-05-20T15:32:46Z
dc.date.available2014-05-20T15:32:46Z
dc.date.issued2010-03-01
dc.description.abstractCuO plates were obtained by microwave-hydrothermal processing at 130 C for 30 min without any surfactant. X-ray diffraction, Rietveld refinement and selected area electron diffraction showed that the CuO plates present a monoclinic structure without secondary phases. The nitrogen adsorption isotherm measurements revealed a specific surface area of approximately 30 m(2)/g. Field-emission gun scanning electron microscopy and transmission electron microscope micrographs indicated that the growth process of these plates was through Ostwald ripening and aggregation of plates surface by Van der Waals forces along to the two [100] and [010] directions. (C) 2009 The Society of Powder Technology Japan. Published by Elsevier B.V. and The Society of Powder Technology Japan. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista, LIEC IQ, BR-14801907 Araraquara, SP, Brazil
dc.description.affiliationUniversidade Federal de São Carlos (UFSCar), LIEC DQ, BR-13565905 São Carlos, SP, Brazil
dc.description.affiliationLab Nacl Luz Sincrotron, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, LIEC IQ, BR-14801907 Araraquara, SP, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipIdFAPESP: 09/50303-4
dc.format.extent197-202
dc.identifierhttp://dx.doi.org/10.1016/j.apt.2009.11.007
dc.identifier.citationAdvanced Powder Technology. Amsterdam: Elsevier B.V., v. 21, n. 2, p. 197-202, 2010.
dc.identifier.doi10.1016/j.apt.2009.11.007
dc.identifier.issn0921-8831
dc.identifier.urihttp://hdl.handle.net/11449/41584
dc.identifier.wosWOS:000277435600017
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofAdvanced Powder Technology
dc.relation.ispartofjcr2.943
dc.relation.ispartofsjr0,694
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectCuOen
dc.subjectPlatesen
dc.subjectRietveld refinementen
dc.subjectMicroscopyen
dc.subjectCrystal growthen
dc.titleStructure and growth mechanism of CuO plates obtained by microwave-hydrothermal without surfactantsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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Araraquara - IQAR - Instituto de Química