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Low-temperature, self-nucleated growth of indium-tin oxide nanostructures by pulsed laser deposition on amorphous substrates

dc.contributor.authorSavu, Raluca
dc.contributor.authorJoanni, Ednan
dc.contributor.institutionINESC
dc.contributor.institutionUniv Trasos Montes & Alto Douro
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:28:32Z
dc.date.available2014-05-20T15:28:32Z
dc.date.issued2006-12-01
dc.description.abstractIndium-tin oxide nanostructures were deposited by excimer laser ablation in a nitrogen atmosphere using catalyst-free oxidized silicon substrates at 500 degrees C. Up to 1 mbar, nanowires grew by the vapor-liquid-solid (VLS) mechanism, with the amount of liquid material decreasing as the deposition pressure increased. The nanowires present the single-crystalline cubic bixbyite structure, oriented < 100 >. For the highest pressure used, pyramids were formed and no sign of liquid material could be observed, indicating that these structures grew by a vapor-solid mechanism. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.en
dc.description.affiliationINESC, UOSE, P-4169007 Oporto, Portugal
dc.description.affiliationUniv Trasos Montes & Alto Douro, Dept Fis, P-5001911 Vila Real, Portugal
dc.format.extent979-981
dc.identifierhttp://dx.doi.org/10.1016/j.scriptamat.2006.05.022
dc.identifier.citationScripta Materialia. Oxford: Pergamon-Elsevier B.V., v. 55, n. 11, p. 979-981, 2006.
dc.identifier.doi10.1016/j.scriptamat.2006.05.022
dc.identifier.issn1359-6462
dc.identifier.urihttp://hdl.handle.net/11449/38334
dc.identifier.wosWOS:000241242500003
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofScripta Materialia
dc.relation.ispartofjcr4.163
dc.relation.ispartofsjr1,923
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectlaser depositionpt
dc.subjectnanocrystalline materialspt
dc.subjectnanostructurept
dc.subjectVLSpt
dc.titleLow-temperature, self-nucleated growth of indium-tin oxide nanostructures by pulsed laser deposition on amorphous substratesen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.orcid0000-0001-9866-3598[1]
unesp.author.orcid0000-0001-5041-1770[2]

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