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An ellipsometric study of manganese oxide films: In situ characterization of the deposition and electroreduction of MnO2

dc.contributor.authorUbeda, M. Hernández
dc.contributor.authorPérez, M. A.
dc.contributor.authorMishima, H. T.
dc.contributor.authorVillullas, H. M. [UNESP]
dc.contributor.authorZerbino, J. O.
dc.contributor.authorDe Mishima, B.A. López
dc.contributor.authorTeijelo, M. López
dc.contributor.institutionUniv. Nac. de Santiago del Estero
dc.contributor.institutionUniv. Nacional de Córdoba
dc.contributor.institutionINIFTA
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-27T11:21:16Z
dc.date.available2014-05-27T11:21:16Z
dc.date.issued2005-02-07
dc.description.abstractThe electrodeposition of manganese oxide films onto a platinum substrate was investigated by means of in situ ellipsometry. In the thickness range from 0 to 150 nm, the anodic oxide behaves as an Isotropic single layer with optical constants that are independent of thickness. Deviations at higher thickness are explained in terms of anisotropic properties of the film. The electroreduction of thin films (up to ca. 150 nm) in an alkaline electrolyte leads to a decrease in both the refractive index and the extinction coefficient and is accompanied by a thickness increase of ca. 10%. The Mn(IV) to Mn(III) conversion takes place from the oxide/electrolyte interface inwards. © 2004 The Electrochemical Society. All rights reserved.en
dc.description.affiliationInst. de Ciencias Químicas Fac. de Agronom. y Agroindustrias Univ. Nac. de Santiago del Estero, 4200 Santiago del Estero
dc.description.affiliationDepartamento de Fisicoquímica INFIQC Univ. Nacional de Córdoba, 5000 Córdoba
dc.description.affiliationINIFTA, 1900 La Plata
dc.description.affiliationInstitute de Química UNESP, 14801-970, Araraquara, SP
dc.description.affiliationUnespInstitute de Química UNESP, 14801-970, Araraquara, SP
dc.identifierhttp://dx.doi.org/10.1149/1.1825951
dc.identifier.citationJournal of the Electrochemical Society, v. 152, n. 1, 2005.
dc.identifier.doi10.1149/1.1825951
dc.identifier.file2-s2.0-12744255073.pdf
dc.identifier.issn0013-4651
dc.identifier.scopus2-s2.0-12744255073
dc.identifier.urihttp://hdl.handle.net/11449/68134
dc.language.isoeng
dc.relation.ispartofJournal of the Electrochemical Society
dc.relation.ispartofjcr3.662
dc.relation.ispartofsjr1,267
dc.rights.accessRightsAcesso aberto
dc.sourceScopus
dc.subjectAnisotropy
dc.subjectComputer simulation
dc.subjectCrystal structure
dc.subjectCrystallography
dc.subjectDiffusion
dc.subjectElectrochemistry
dc.subjectElectrodeposition
dc.subjectElectrolytes
dc.subjectEllipsometry
dc.subjectMathematical models
dc.subjectPrecipitation (chemical)
dc.subjectRaman spectroscopy
dc.subjectReduction
dc.subjectRefractive index
dc.subjectX ray photoelectron spectroscopy
dc.subjectElectrochemical films
dc.subjectManganese oxide films
dc.subjectOptical response
dc.subjectStep potential electrochemical spectroscopy (SPES)
dc.subjectManganese compounds
dc.titleAn ellipsometric study of manganese oxide films: In situ characterization of the deposition and electroreduction of MnO2en
dc.typeArtigo
dcterms.licensehttp://www.electrochem.org/dl/support/assets/crtf.pdf
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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