Publicação: The effect of chloride ions and A. ferrooxidans on the oxidative dissolution of the chalcopyrite evaluated by electrochemical noise analysis (ENA)
dc.contributor.author | Horta, D. G. [UNESP] | |
dc.contributor.author | Acciari, H. A. [UNESP] | |
dc.contributor.author | Bevilaqua, D. [UNESP] | |
dc.contributor.author | Benedetti, Assis Vicente [UNESP] | |
dc.contributor.author | Garcia, O. [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-27T11:24:35Z | |
dc.date.available | 2014-05-27T11:24:35Z | |
dc.date.issued | 2009-12-28 | |
dc.description.abstract | It is believed that the dissolution of chalcopyrite (CuFeS2) in acid medium can be accelerated by the addition of Cl- ions, which modify the electrochemical reactions in the leaching system. Electrochemical noise analysis (ENA) was utilized to evaluate the effect of the Cl- ions and Acidithiobacillus ferrooxidans on the oxidative dissolution of a CPE-chalcopyrite (carbon paste electrode modified with chalcopyrite) in acid medium. The emphasis was on the analysis of the admittance plots (Ac) calculated by ENA. In general, a stable passive behavior was observed, mainly during the initial stages of CPE-chalcopyrite immersion, characterized by a low passive current and a low dispersion of the Ac plots, mainly after bacteria addition. This can be explained by the adhesion of bacterial cells on the CPE-chalcopyrite surface acting as a physical barrier. The greater dispersions in the Ac plots occurred immediately after the Cl- ions addition, in the absence of bacteria characterizing an active-state. In the presence of bacteria the addition of Clions only produced some effect after some time due to the barrier effect caused by bacteria adhesion. © (2009) Trans Tech Publications. | en |
dc.description.affiliation | São Paulo State University UNESP Institute of Chemistry, Post Box 355, 14801-970, Araraquara, SP | |
dc.description.affiliationUnesp | São Paulo State University UNESP Institute of Chemistry, Post Box 355, 14801-970, Araraquara, SP | |
dc.format.extent | 397-400 | |
dc.identifier | http://dx.doi.org/10.4028/www.scientific.net/AMR.71-73.397 | |
dc.identifier.citation | Advanced Materials Research, v. 71-73, p. 397-400. | |
dc.identifier.doi | 10.4028/www.scientific.net/AMR.71-73.397 | |
dc.identifier.issn | 1022-6680 | |
dc.identifier.scopus | 2-s2.0-72449125605 | |
dc.identifier.uri | http://hdl.handle.net/11449/71498 | |
dc.identifier.wos | WOS:000273541600088 | |
dc.language.iso | eng | |
dc.relation.ispartof | Advanced Materials Research | |
dc.relation.ispartofsjr | 0,121 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Scopus | |
dc.subject | Admittance | |
dc.subject | Bioleaching | |
dc.subject | Chalcopyrite | |
dc.subject | Electrochemical noise analysis | |
dc.subject | Acid medium | |
dc.subject | Acidithiobacillus ferrooxidans | |
dc.subject | Bacterial cells | |
dc.subject | Barrier effects | |
dc.subject | Carbon paste electrode | |
dc.subject | Chloride ions | |
dc.subject | Cl- ions | |
dc.subject | Electrochemical Noise Analysis | |
dc.subject | Electrochemical reactions | |
dc.subject | Ferrooxidans | |
dc.subject | Initial stages | |
dc.subject | Oxidative dissolution | |
dc.subject | Passive behavior | |
dc.subject | Physical barriers | |
dc.subject | Acids | |
dc.subject | Adhesion | |
dc.subject | Bacteriology | |
dc.subject | Cell adhesion | |
dc.subject | Chlorine compounds | |
dc.subject | Copper compounds | |
dc.subject | Dispersions | |
dc.subject | Dissolution | |
dc.subject | Electric network analysis | |
dc.subject | Ions | |
dc.subject | Surface chemistry | |
dc.subject | Metal recovery | |
dc.title | The effect of chloride ions and A. ferrooxidans on the oxidative dissolution of the chalcopyrite evaluated by electrochemical noise analysis (ENA) | en |
dc.type | Trabalho apresentado em evento | |
dcterms.license | http://www.scientific.net/AMR | |
dspace.entity.type | Publication | |
unesp.author.lattes | 1769008264876945[4] | |
unesp.author.orcid | 0000-0002-0243-6639[4] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Físico-Química - IQAR | pt |