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Publicação:
Vertical and in-plane electrical transport in InAs/InP semiconductor nanostructures

dc.contributor.authorVicaro, K. O.
dc.contributor.authorBortoleto, J. R R [UNESP]
dc.contributor.authorGutiérrez, H. R.
dc.contributor.authorNieto, L.
dc.contributor.authorVon Zuben, A. A G
dc.contributor.authorSeabra, A. C.
dc.contributor.authorSchulz, P. A.
dc.contributor.authorCotta, M. A.
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionDept. of Physics
dc.date.accessioned2014-05-27T11:21:22Z
dc.date.available2014-05-27T11:21:22Z
dc.date.issued2005-06-20
dc.description.abstractVertical and in-plane electrical transport in InAs/InP semiconductors wires and dots have been investigated by conductive atomic force microscopy (C-AFM) and electrical measurements in processed devices. Localized I-V spectroscopy and spatially resolved current images (at constant bias), carried out using C-AFM in a controlled atmosphere at room temperature, show different conductances and threshold voltages for current onset on the two types of nanostructures. The processed devices were used in order to access the in-plane conductance of an assembly with a reduced number of nanostructures. On these devices, signature of two-level random telegraph noise (RTN) in the current behavior with time at constant bias is observed. These levels for electrical current can be associated to electrons removed from the wetting layer and trapped in dots and/or wires. A crossover from conduction through the continuum, associated to the wetting layer, to hopping within the nanostructures is observed with increasing temperature. This transport regime transition is confirmed by a temperature-voltage phase diagram. © 2005 Materials Research Society.en
dc.description.affiliationInstituto de Física Gleb Wataghin DFA/LPD UNICAMP, CP6165, 13081-790, Campinas-SP
dc.description.affiliationLSI-PSI-EPUSP USP, Trav. 3, no 158, 05508-900, São Paulo-SP
dc.description.affiliationInstitute de Física Gleb Wataghin DFMC UNICAMP, 13081-790, Campinas-SP
dc.description.affiliationLaPTec GPM-UNESP, Av. 3 de Março, 511, 18085-180, Sorocaba-SP
dc.description.affiliationPennsylvania State University Dept. of Physics, 16802-6300, PA
dc.description.affiliationUnespLaPTec GPM-UNESP, Av. 3 de Março, 511, 18085-180, Sorocaba-SP
dc.format.extent69-74
dc.identifierhttp://dx.doi.org/10.1557/PROC-829-B2.3
dc.identifier.citationMaterials Research Society Symposium Proceedings, v. 829, p. 69-74.
dc.identifier.doi10.1557/PROC-829-B2.3
dc.identifier.issn0272-9172
dc.identifier.scopus2-s2.0-20344367044
dc.identifier.urihttp://hdl.handle.net/11449/68286
dc.language.isoeng
dc.relation.ispartofMaterials Research Society Symposium Proceedings
dc.relation.ispartofsjr0,139
dc.rights.accessRightsAcesso aberto
dc.sourceScopus
dc.subjectAtomic force microscopy
dc.subjectChemical beam epitaxy
dc.subjectElectric potential
dc.subjectElectronic structure
dc.subjectElectrons
dc.subjectLithography
dc.subjectMOS devices
dc.subjectSemiconducting indium phosphide
dc.subjectCarrier localization
dc.subjectElectrical transport
dc.subjectNanowires
dc.subjectRandom telegraph noise (RTN)
dc.subjectNanostructured materials
dc.titleVertical and in-plane electrical transport in InAs/InP semiconductor nanostructuresen
dc.typeTrabalho apresentado em evento
dcterms.licensehttp://journals.cambridge.org/action/displaySpecialPage?pageId=4676
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Ciência e Tecnologia, Sorocabapt
unesp.departmentEngenharia de Controle e Automação - ICTSpt

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