Al-based anodic oxide films structure observation using field emission gun scanning electron microscopy
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Data
2006-02-20
Autores
Regone, N. N.
Freire, CMA
Ballester, M.
Título da Revista
ISSN da Revista
Título de Volume
Editor
Elsevier B.V.
Resumo
In the present work, the anodic oxide films of Al, Al-Cu 4.5% and Al-Si 6.5% alloys are formed using direct and pulse current. In the case of Al-Cu and Al-Si alloys, the electrolyte used contains sulfuric acid and oxalic acid, meanwhile for Al the electrolyte contains sulfuric acid only. Al-Cu alloy was submitted to a heat treatment in order to decrease the effect of inter metallic phase theta upon the anodic film structure. Fractured samples were observed using a field emission gun scanning electron microscope JSM-6330F at (LME)/Brazilian Synchrotron Light Laboratory (LNLS), Campinas, SP, Brazil. The oxide film images enable evaluation of the pore size and form with a resolution similar to the transmission electron microscope (TEM) resolution. It is also observed that the anodizing process using pulse current produces an irregular structure of pore walls, and by direct cur-rent it is produced a rectilinear pore wall. (c) 2005 Elsevier B.V. All rights reserved.
Descrição
Palavras-chave
anodizing, field emission gun microscopy, aluminum, Al-Cu alloy, Al-Si alloy
Como citar
Journal of Materials Processing Technology. Lausanne: Elsevier B.V. Sa, v. 172, n. 1, p. 146-151, 2006.