Zero Temperature Coefficient Behavior for Advanced MOSFETs

Abstract

In this work the Zero Temperature Coefficient (ZTC) is investigated experimentally using state-of-the-art industrial technologies like Ultra-Thin Body and Buried Oxide (UTBB) and triple-gate FinFETs (irradiated and/or strained devices), both fabricated on Silicon On lnsulator (SOI) wafers. A simple analytical model to analyze the behavior of the gate-source voltage at the Zero Temperature Coefficient point (V-ZTC) is validated for these advanced devices. Although simple, the model predictions have shown good agreement with the experimental results and can be useful for low-power low-voltage analog circuit designers, where biasing at/near the ZTC point should result in low thermal drift of the circuit operation.