Al-based anodic oxide films structure observation using field emission gun scanning electron microscopy

Página do item simplificado
dc.contributor.authorRegone, N. N.
dc.contributor.authorFreire, CMA
dc.contributor.authorBallester, M.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2014-05-20T13:12:01Z
dc.date.available2014-05-20T13:12:01Z
dc.date.issued2006-02-20
dc.description.abstractIn the present work, the anodic oxide films of Al, Al-Cu 4.5% and Al-Si 6.5% alloys are formed using direct and pulse current. In the case of Al-Cu and Al-Si alloys, the electrolyte used contains sulfuric acid and oxalic acid, meanwhile for Al the electrolyte contains sulfuric acid only. Al-Cu alloy was submitted to a heat treatment in order to decrease the effect of inter metallic phase theta upon the anodic film structure. Fractured samples were observed using a field emission gun scanning electron microscope JSM-6330F at (LME)/Brazilian Synchrotron Light Laboratory (LNLS), Campinas, SP, Brazil. The oxide film images enable evaluation of the pore size and form with a resolution similar to the transmission electron microscope (TEM) resolution. It is also observed that the anodizing process using pulse current produces an irregular structure of pore walls, and by direct cur-rent it is produced a rectilinear pore wall. (c) 2005 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Fed São Paulo, UNESP, BR-18409010 Itapeva, SP, Brazil
dc.description.affiliationUniv Estadual Campinas, Dept Mat Engn, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUniv Estadual Campinas, Dept Appl Phys, IFGW, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespUniv Fed São Paulo, UNESP, BR-18409010 Itapeva, SP, Brazil
dc.format.extent146-151
dc.identifierhttp://dx.doi.org/10.1016/j.jmatprotec.2005.09.005
dc.identifier.citationJournal of Materials Processing Technology. Lausanne: Elsevier B.V. Sa, v. 172, n. 1, p. 146-151, 2006.
dc.identifier.doi10.1016/j.jmatprotec.2005.09.005
dc.identifier.issn0924-0136
dc.identifier.urihttp://hdl.handle.net/11449/31
dc.identifier.wosWOS:000235379700019
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofJournal of Materials Processing Technology
dc.relation.ispartofjcr3.647
dc.relation.ispartofsjr1,695
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectanodizingpt
dc.subjectfield emission gun microscopypt
dc.subjectaluminumpt
dc.subjectAl-Cu alloypt
dc.subjectAl-Si alloypt
dc.titleAl-based anodic oxide films structure observation using field emission gun scanning electron microscopyen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Ciências e Engenharia, Itapevapt

Arquivos

Licença do Pacote
Agora exibindo 1 - 1 de 1
Nenhuma Miniatura disponível
Nome:
license.txt
Tamanho:
1.71 KB
Formato:
Item-specific license agreed upon to submission
Descrição:

Coleções

Artigos - Engenharia Industrial Madeireira - Itapeva