Effects of helium ion irradiation on fluorinated plasma polymers

dc.contributor.authorLopes, Bruno B. [UNESP]
dc.contributor.authorSchreiner, Wido
dc.contributor.authorDavanzo, Celso U.
dc.contributor.authorDurrant, Steven F. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal do Paraná (UFPR)
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2014-05-20T15:30:29Z
dc.date.available2014-05-20T15:30:29Z
dc.date.issued2010-06-25
dc.description.abstractThe effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C(2)H(2)-SF(6), C(6)H(6)-SF(6) or C(6)F(6) produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm(-1) range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically similar to 5%). The films produced from SF(6)-containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. (C) 2010 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUniversidade Federal do Paraná (UFPR), BR-80060000 Curitiba, Parana, Brazil
dc.description.affiliationUniv Estadual Campinas, Inst Quim, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.format.extent3059-3063
dc.identifierhttp://dx.doi.org/10.1016/j.surfcoat.2010.02.016
dc.identifier.citationSurface & Coatings Technology. Lausanne: Elsevier B.V. Sa, v. 204, n. 18-19, p. 3059-3063, 2010.
dc.identifier.doi10.1016/j.surfcoat.2010.02.016
dc.identifier.issn0257-8972
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/39845
dc.identifier.wosWOS:000279378600039
dc.language.isoeng
dc.publisherElsevier B.V. Sa
dc.relation.ispartofSurface & Coatings Technology
dc.relation.ispartofjcr2.906
dc.relation.ispartofsjr0,928
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectPECVDen
dc.subjectIon implantationen
dc.subjectFluorinated thin filmsen
dc.subjectPlasma polymersen
dc.subjectXPSen
dc.subjectIRRASen
dc.titleEffects of helium ion irradiation on fluorinated plasma polymersen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V. Sa
unesp.author.orcid0000-0002-4511-3768[4]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Ciência e Tecnologia, Sorocabapt
unesp.departmentEngenharia de Controle e Automação - ICTSpt

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