Effects of helium ion irradiation on fluorinated plasma polymers
dc.contributor.author | Lopes, Bruno B. [UNESP] | |
dc.contributor.author | Schreiner, Wido | |
dc.contributor.author | Davanzo, Celso U. | |
dc.contributor.author | Durrant, Steven F. [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Universidade Federal do Paraná (UFPR) | |
dc.contributor.institution | Universidade Estadual de Campinas (UNICAMP) | |
dc.date.accessioned | 2014-05-20T15:30:29Z | |
dc.date.available | 2014-05-20T15:30:29Z | |
dc.date.issued | 2010-06-25 | |
dc.description.abstract | The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C(2)H(2)-SF(6), C(6)H(6)-SF(6) or C(6)F(6) produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm(-1) range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically similar to 5%). The films produced from SF(6)-containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. (C) 2010 Elsevier B.V. All rights reserved. | en |
dc.description.affiliation | Univ Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil | |
dc.description.affiliation | Universidade Federal do Paraná (UFPR), BR-80060000 Curitiba, Parana, Brazil | |
dc.description.affiliation | Univ Estadual Campinas, Inst Quim, BR-13083970 Campinas, SP, Brazil | |
dc.description.affiliationUnesp | Univ Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil | |
dc.format.extent | 3059-3063 | |
dc.identifier | http://dx.doi.org/10.1016/j.surfcoat.2010.02.016 | |
dc.identifier.citation | Surface & Coatings Technology. Lausanne: Elsevier B.V. Sa, v. 204, n. 18-19, p. 3059-3063, 2010. | |
dc.identifier.doi | 10.1016/j.surfcoat.2010.02.016 | |
dc.identifier.issn | 0257-8972 | |
dc.identifier.orcid | 0000-0002-4511-3768 | |
dc.identifier.uri | http://hdl.handle.net/11449/39845 | |
dc.identifier.wos | WOS:000279378600039 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. Sa | |
dc.relation.ispartof | Surface & Coatings Technology | |
dc.relation.ispartofjcr | 2.906 | |
dc.relation.ispartofsjr | 0,928 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | PECVD | en |
dc.subject | Ion implantation | en |
dc.subject | Fluorinated thin films | en |
dc.subject | Plasma polymers | en |
dc.subject | XPS | en |
dc.subject | IRRAS | en |
dc.title | Effects of helium ion irradiation on fluorinated plasma polymers | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. Sa | |
unesp.author.orcid | 0000-0002-4511-3768[4] | |
unesp.campus | Universidade Estadual Paulista (Unesp), Instituto de Ciência e Tecnologia, Sorocaba | pt |
unesp.department | Engenharia de Controle e Automação - ICTS | pt |
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