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Tetraethylortossilicate plasma thin film with hydrophilic and hydrophobic characteristics: Use on passive mixers

dc.contributor.authorHernandez, Leonardo Frois
dc.contributor.authorLima, Roberto da Rocha
dc.contributor.authorPecoraro, Édison [UNESP]
dc.contributor.authorRosim-Fachini, Esteban
dc.contributor.authorSilva, Maria Lucia Pereira da
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionUniversity of Aveiro
dc.contributor.institutionUniversity of Puerto Rico at Río Piedras
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2015-05-15T13:30:23Z
dc.date.available2015-05-15T13:30:23Z
dc.date.issued2012
dc.description.abstractThis work aims to obtain plasma thin film composites with hydrophobic/hydrophilic alternated regions, which are useful for the production of miniaturized mixers. These regions were acquired by two different strategies: either the codeposition of TEOS and HFE plasma thin films or the exposition of TEOS plasma films to ultraviolet radiation (UVA and UVC). These films were characterized by several chemical and physical techniques. The refractive indexes vary from 1.4 to 1.7; infrared and photoelectron spectroscopy detect Si-O-Si and CHn species. Silicone-like structures with high or low number of amorphous carbon microparticles and with fluorinated organic clusters were produced. Cluster dimensions were in the 1-5 mm range and they are made of graphite or COF (carbon/oxygen/fluorine) compounds. Scanning electron and optical microscopy showed rough surfaces. Water contact angles were 90º; however, for TEOS films that value changed after 6 hr of UVC exposure. Moreover, after UV exposure, organic polar compounds could be adsorbed in those films and water was not. The passive mixer performance was simulated using the FemLab 3.2® program and was tested with 20 nm thick films on a silicon wafer, showing the capacity of these films to be used in such devices.en
dc.description.affiliationUniversidade Estadual Paulista Júlio de Mesquita Filho, Instituto de Química de Araraquara, Araraquara, Rua Prof. Francisco Degni, 55, Jardim Quitandinha, CEP 14800-900, SP, Brasil
dc.description.affiliationUnespUniversidade Estadual Paulista Júlio de Mesquita Filho, Instituto de Química de Araraquara
dc.format.extent245-250
dc.identifierhttp://www.scientific.net/MSF.730-732.245
dc.identifier.citationMaterials Science Forum, v. 730-732, p. 245-250, 2012.
dc.identifier.doi10.4028/www.scientific.net/MSF.730-732.245
dc.identifier.issn1662-9752
dc.identifier.lattes8720313833237172
dc.identifier.lattes0528258491277437
dc.identifier.orcid0000-0002-5049-8797
dc.identifier.urihttp://hdl.handle.net/11449/123548
dc.language.isoeng
dc.relation.ispartofMaterials Science Forum
dc.rights.accessRightsAcesso restrito
dc.sourceCurrículo Lattes
dc.subjectMicromixersen
dc.subjectPlasma depositionen
dc.subjectTEOSen
dc.titleTetraethylortossilicate plasma thin film with hydrophilic and hydrophobic characteristics: Use on passive mixersen
dc.typeArtigo
unesp.author.lattes8720313833237172
unesp.author.lattes0528258491277437[3]
unesp.author.orcid0000-0002-5049-8797[3]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt
unesp.departmentQuímica Inorgânica - IQARpt

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