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Nanostructure and properties of ZnO films produced by the pyrosol process

dc.contributor.authorHammer, Peter [UNESP]
dc.contributor.authorTokumoto, M. S.
dc.contributor.authorSantilli, Celso Valentim [UNESP]
dc.contributor.authorPulcinelli, Sandra Helena [UNESP]
dc.contributor.authorCraievich, A. F.
dc.contributor.authorSmith, A.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionGEMH
dc.date.accessioned2014-05-20T15:26:54Z
dc.date.available2014-05-20T15:26:54Z
dc.date.issued2003-06-01
dc.description.abstractIndium doped ZnO films were deposited by the pyrosol process on glass substrates at different temperatures from solutions containing In/Zn molar ratios up to 10%. The nanostructure of the films was investigated using grazing-incidence small angle X-ray scattering (GISAXS). The mass density was determined by X-ray reflectivity and the composition by X-ray photoelectron spectroscopy. The GISAXS measurements revealed an anisotropic pattern for films deposited at 573 and 623 K and a isotropic one for those deposited at higher temperatures. The anisotropic patterns indicate the presence of elongated nanopores with their long axes perpendicular to the film surface. In contrast, the isotropic nature of GISAXS patterns of films grown at high temperatures (673 and 723 K) suggests the presence of spherical voids. The pore size distribution function determined from the isotropic patterns indicates a multimodal size distribution. on the other hand, the measured mass density of the doped films with isotropic nanotexture is higher than that of the anisotropic films while the electric resistivity is significantly lower. This is in agreement with the detected strong reduction of the void density and specific surface area at approximately constant pore size.en
dc.description.affiliationUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUSP, Inst Fis, BR-09500900 São Paulo, Brazil
dc.description.affiliationGEMH, ENSCI, F-87065 Limoges, France
dc.description.affiliationUnespUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil
dc.format.extent435-438
dc.identifierhttp://dx.doi.org/10.1107/S0021889803000372
dc.identifier.citationJournal of Applied Crystallography. Copenhagen: Blackwell Munksgaard, v. 36, p. 435-438, 2003.
dc.identifier.doi10.1107/S0021889803000372
dc.identifier.issn0021-8898
dc.identifier.lattes6466841023506131
dc.identifier.lattes5584298681870865
dc.identifier.lattes9971202585286967
dc.identifier.orcid0000-0002-3823-0050
dc.identifier.orcid0000-0002-8356-8093
dc.identifier.urihttp://hdl.handle.net/11449/36975
dc.identifier.wosWOS:000182284400011
dc.language.isoeng
dc.publisherBlackwell Munksgaard
dc.relation.ispartofJournal of Applied Crystallography
dc.relation.ispartofsjr1,635
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectzinc oxidept
dc.subjectnanostructurept
dc.subjectgrazing-incidence small angle X-ray scatteringpt
dc.subjectdensitypt
dc.subjectconductivitypt
dc.titleNanostructure and properties of ZnO films produced by the pyrosol processen
dc.typeArtigo
dcterms.licensehttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dcterms.rightsHolderBlackwell Munksgaard
unesp.author.lattes6466841023506131(1)
unesp.author.lattes9971202585286967
unesp.author.lattes5584298681870865[3]
unesp.author.orcid0000-0002-3823-0050(1)
unesp.author.orcid0000-0002-8356-8093[3]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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