Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

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dc.contributor.authorTurri, Rafael G. [UNESP]
dc.contributor.authorSantos, Ricardo M. [UNESP]
dc.contributor.authorRangel, Elidiane Cipriano [UNESP]
dc.contributor.authorCruz, Nilson Cristino da [UNESP]
dc.contributor.authorBortoleto, José R.R. [UNESP]
dc.contributor.authorDias Da Silva, José H. [UNESP]
dc.contributor.authorAntonio, César Augusto [UNESP]
dc.contributor.authorDurrant, Steven Frederick [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-27T11:30:31Z
dc.date.available2014-05-27T11:30:31Z
dc.date.issued2013-09-01
dc.description.abstractDiverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, ETauc, of these films were obtained via transmission spectra in the ultraviolet-visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of ETauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased ETauc. The mechanical properties - hardness, elastic modulus and stiffness - of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD. ©2013 Elsevier B.V. All rights reserved.en
dc.description.affiliationLaboratório de Plasmas Tecnológicos Universidade Estadual Paulista (UNESP), Av. Três de Marco 511, Alto de Boa Vista, 18087-180, Sorocaba, SP
dc.description.affiliationLaboratório de Filmes Semicondutores Depto. de Física UNESP, Bauru, SP
dc.description.affiliationUnespLaboratório de Plasmas Tecnológicos Universidade Estadual Paulista (UNESP), Av. Três de Marco 511, Alto de Boa Vista, 18087-180, Sorocaba, SP
dc.description.affiliationUnespLaboratório de Filmes Semicondutores Depto. de Física UNESP, Bauru, SP
dc.format.extent474-481
dc.identifierhttp://dx.doi.org/10.1016/j.apsusc.2013.05.013
dc.identifier.citationApplied Surface Science, v. 280, p. 474-481.
dc.identifier.doi10.1016/j.apsusc.2013.05.013
dc.identifier.issn0169-4332
dc.identifier.lattes7157327220048138
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.scopus2-s2.0-84879686471
dc.identifier.urihttp://hdl.handle.net/11449/76392
dc.identifier.wosWOS:000321045700071
dc.language.isoeng
dc.relation.ispartofApplied Surface Science
dc.relation.ispartofjcr4.439
dc.relation.ispartofsjr1,093
dc.rights.accessRightsAcesso restrito
dc.sourceScopus
dc.subjectAFM
dc.subjectNano-indentation
dc.subjectOptical properties
dc.subjectSurface energy
dc.subjectUltraviolet-visible near infrared spectroscopy
dc.subjectAbsorption co-efficient
dc.subjectCarbonaceous thin films
dc.subjectFilm roughness
dc.subjectNear-infrared range
dc.subjectPlasma immersion ion implantation and deposition
dc.subjectRadio-frequency plasma enhanced chemical vapor deposition
dc.subjectTransmission spectrums
dc.subjectAmorphous carbon
dc.subjectAmorphous silicon
dc.subjectAtomic force microscopy
dc.subjectCarbon films
dc.subjectDeposition
dc.subjectElastic moduli
dc.subjectHardness
dc.subjectInterfacial energy
dc.subjectIon implantation
dc.subjectNear infrared spectroscopy
dc.subjectPlasma enhanced chemical vapor deposition
dc.subjectRefractive index
dc.subjectSilicon
dc.subjectStiffness
dc.subjectSurface roughness
dc.subjectVapors
dc.subjectAmorphous films
dc.titleOptical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and depositionen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
unesp.author.lattes7157327220048138
unesp.author.orcid0000-0002-4511-3768[8]
unesp.campusUniversidade Estadual Paulista (Unesp), Faculdade de Ciências, Baurupt
unesp.departmentFísica - FCpt

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