Electrochemical studies with a Cu-5wt.%Ni alloy in 0.5 M H2SO4

dc.contributor.authorHurtado, MRF
dc.contributor.authorSumodjo, PTA
dc.contributor.authorBenedetti, Assis Vicente [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.date.accessioned2014-05-20T15:25:39Z
dc.date.available2014-05-20T15:25:39Z
dc.date.issued2003-08-15
dc.description.abstractThe electrochemical behavior of the annealed Cu-5wt.%Ni alloy in 0.5 M H2SO4 was studied by means of open-circuit potential (E-OCP) measurements, cyclic voltammetry, electrochemical impedance spectroscopy (EIS), and quasi-stationary linear potential sweep. The hydrodynamics of the system was also studied. This material is constituted by a single a, phase. The anodic behavior of a Cu-Ni alloy in H2SO4 consists fundamentally on the electrodissolution of Cu, its main component, and the formation of a sulfur-containing passive layer. The presence of Ni decreases the rate of Cu oxidation, mostly at high positive potentials. The impedance spectra, obtained for the unrotating electrode, can be interpreted in terms of a simple charge-transfer reaction across a surface layer. When the electrode is rotated, the occurrence of an inductive loop evidenced the existence of an adsorbed layer. All the resistance estimated from the proposed equivalent circuits diminished with the electrode rotation rate, emphasizing the influence of ion transport in the overall electrode process. The system presented two anodic Tafel slopes: 40 mV dec(-1) for E < 255 mV and 67 mV dec(-1) for E > 275 mV. A Tafel slope of 40 mV dec(-1) evidences that copper dissolution can be interpreted in terms of the mechanism proposed by Mattsson and Bockris. The second Tafel suggests that at potentials more positive than 275 mV, copper dissolves according to a mechanism that considers the disproportionation of adsorbed Cu(1) species. (C) 2003 Elsevier Ltd. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.description.affiliationUniv São Paulo, Inst Quim, BR-05599970 São Paulo, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.format.extent2791-2798
dc.identifierhttp://dx.doi.org/10.1016/S0013-4686(03)00413-4
dc.identifier.citationElectrochimica Acta. Oxford: Pergamon-Elsevier B.V., v. 48, n. 19, p. 2791-2798, 2003.
dc.identifier.doi10.1016/S0013-4686(03)00413-4
dc.identifier.issn0013-4686
dc.identifier.urihttp://hdl.handle.net/11449/36023
dc.identifier.wosWOS:000184501200009
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofElectrochimica Acta
dc.relation.ispartofjcr5.116
dc.relation.ispartofsjr1,439
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectcopper-nickel alloyspt
dc.subjectimpedance spectroscopypt
dc.subjectsulfuric acidpt
dc.subjectpolarization measurementspt
dc.titleElectrochemical studies with a Cu-5wt.%Ni alloy in 0.5 M H2SO4en
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.lattes1769008264876945[3]
unesp.author.orcid0000-0002-0243-6639[3]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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