Amorphous hydrogenated carbon films treated by SF(6) plasma

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Data

2009-01-01

Autores

Marins, N. M. S. [UNESP]
Mota, Rogério Pinto [UNESP]
Santos, D. C. R. [UNESP]
Honda, Roberto Yzumi [UNESP]
Kayama, M. E. [UNESP]
Kostov, K. G. [UNESP]
Algatti, M. A. [UNESP]
Cruz, N. C.
Rangel, E. C.

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Iop Publishing Ltd

Resumo

This work was performed to verify the chemical structure, mechanical and hydrophilic properties of amorphous hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition, using acetylene/argon mixture as monomer. Films were prepared in a cylindrical quartz reactor, fed by 13.56 MHz radiofrequency. The films were grown during 5 min, for power varying from 25 to 125 W at a fixed pressure of 9.5 Pa. After deposition, all samples were treated by SF(6) plasma with the aim of changing their hydrophilic character. Film chemical structure investigated by Raman spectroscopy, revealed the increase of sp(3) hybridized carbon bonds as the plasma power increases. Hardness measurements performed by the nanoindentation technique showed an improvement from 5 GPa to 14 GPa following the increase discharge power. The untreated films presented a hydrophilic character, which slightly diminished after SF(6) plasma treatment.

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Xix Latin American Symposium on Solid State Physics (slafes). Bristol: Iop Publishing Ltd, v. 167, p. 4, 2009.