Effect of oxidizing atmosphere on the electrical properties of SrBi4Ti4O15 thin films obtained by the polymeric precursor method
dc.contributor.author | Simões, Alexandre Zirpoli [UNESP] | |
dc.contributor.author | Ramirez, M. A. [UNESP] | |
dc.contributor.author | Riccardi, C. S. [UNESP] | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-20T13:28:18Z | |
dc.date.available | 2014-05-20T13:28:18Z | |
dc.date.issued | 2008-12-01 | |
dc.description.abstract | Strontium bismuth titanate (SrBi4Ti4O15) thin films were deposited on (111) Pt/Ti/SiO2/Si Substrates by spin coating from the polymeric precursor method. Annealing in static air and dynamic oxygen atmosphere was performed at 700 degrees C for 2 h. The films were characterized by X-ray diffraction, atomic force microscopy and electric properties. The dielectric properties of SrBi4Ti4O15 films were found to be remarkably sensitive to the annealing atmosphere. The C-V characteristics of the metal-ferroelectric metal structure showed a typical butterfly loop that confirms the ferroelectric properties of the film related to the domains switching. SrBi4Ti4O15 thin films annealed in oxygen atmosphere showed lower ferroelectric behavior indicating a weak ferroelectricity along c-axis direction. Published by Elsevier Masson SAS. | en |
dc.description.affiliation | São Paulo State Univ UNESP, Inst Chem, BR-14801970 Araraguara, SP, Brazil | |
dc.description.affiliation | São Paulo State Univ UNESP, BR-17033360 Bauru, SP, Brazil | |
dc.description.affiliationUnesp | São Paulo State Univ UNESP, Inst Chem, BR-14801970 Araraguara, SP, Brazil | |
dc.description.affiliationUnesp | São Paulo State Univ UNESP, BR-17033360 Bauru, SP, Brazil | |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | |
dc.format.extent | 1951-1957 | |
dc.identifier | http://dx.doi.org/10.1016/j.solidstatesciences.2008.03.027 | |
dc.identifier.citation | Solid State Sciences. Amsterdam: Elsevier B.V., v. 10, n. 12, p. 1951-1957, 2008. | |
dc.identifier.doi | 10.1016/j.solidstatesciences.2008.03.027 | |
dc.identifier.issn | 1293-2558 | |
dc.identifier.lattes | 3573363486614904 | |
dc.identifier.uri | http://hdl.handle.net/11449/9414 | |
dc.identifier.wos | WOS:000262236800044 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. | |
dc.relation.ispartof | Solid State Sciences | |
dc.relation.ispartofjcr | 1.861 | |
dc.relation.ispartofsjr | 0,574 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | Thin films | en |
dc.subject | Atomic force microscopy | en |
dc.subject | Dielectric properties | en |
dc.title | Effect of oxidizing atmosphere on the electrical properties of SrBi4Ti4O15 thin films obtained by the polymeric precursor method | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. | |
unesp.author.lattes | 3573363486614904 | |
unesp.author.lattes | 0173401604473200[3] | |
unesp.author.orcid | 0000-0003-2192-5312[3] | |
unesp.campus | Universidade Estadual Paulista (Unesp), Instituto de Química, Araraquara | pt |
unesp.campus | Universidade Estadual Paulista (Unesp), Faculdade de Engenharia, Guaratinguetá | pt |
unesp.department | Materiais e Tecnologia - FEG | pt |
unesp.department | Bioquímica e Tecnologia - IQAR | pt |
unesp.department | Físico-Química - IQAR | pt |
Arquivos
Licença do Pacote
1 - 2 de 2
Nenhuma Miniatura disponível
- Nome:
- license.txt
- Tamanho:
- 1.71 KB
- Formato:
- Item-specific license agreed upon to submission
- Descrição:
Nenhuma Miniatura disponível
- Nome:
- license.txt
- Tamanho:
- 1.71 KB
- Formato:
- Item-specific license agreed upon to submission
- Descrição: