Logo do repositório

Improving Graphene-metal Contacts: Thermal Induced Polishing

dc.contributor.authorOliveira, Eliezer Fernando
dc.contributor.authorBarbosa dos Santos, Ricardo Paupitz [UNESP]
dc.contributor.authorSilva Antreto, Pedro Alves da
dc.contributor.authorMoshkalev, Stanislav
dc.contributor.authorGalvao, Douglas Soares
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal do ABC (UFABC)
dc.date.accessioned2018-11-26T15:47:43Z
dc.date.available2018-11-26T15:47:43Z
dc.date.issued2018-01-01
dc.description.abstractGraphene is a very promising material for nanoelectronics applications due to its unique and remarkable electronic and thermal properties. However, when deposited on metallic electrodes the overall thermal conductivity is significantly decreased. This phenomenon has been attributed to the mismatch between the interfaces and contact thermal resistance. Experimentally, one way to improve the graphene/metal contact is thorough high-temperature annealing, but the detailed mechanisms behind these processes remain unclear. In order to address these questions, we carried out fully atomistic reactive molecular dynamics simulations using the ReaxFF force field to investigate the interactions between multi-layer graphene and metallic electrodes (nickel) under (thermal) annealing. Our results show that the annealing induces an upward-downward movement of the graphene layers, causing a pile-driver-like effect over the metallic surface. This graphene induced movements cause a planarization (thermal polishing-like effect) of the metallic surface, which results in the increase of the effective graphene/metal contact area. This can also explain the experimentally observed improvements of the thermal and electric conductivities.en
dc.description.affiliationUniv Estadual Campinas, Gleb Wataghin Inst Phys, Campinas, SP, Brazil
dc.description.affiliationUniv Campinas UNICAMP, CCES, Campinas, SP, Brazil
dc.description.affiliationSao Paulo State Univ UNESP, Inst Geosci & Exact Sci, Rio Claro, SP, Brazil
dc.description.affiliationFed Univ ABC, Ctr Nat Human Sci, Santo Andre, SP, Brazil
dc.description.affiliationState Univ Campinas UNICAMP, Ctr Semicond Components, Campinas, SP, Brazil
dc.description.affiliationUnespSao Paulo State Univ UNESP, Inst Geosci & Exact Sci, Rio Claro, SP, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2013/08293-7
dc.description.sponsorshipIdFAPESP: 2016/18499-0
dc.format.extent73-78
dc.identifierhttp://dx.doi.org/10.1557/adv.2018.66
dc.identifier.citationMrs Advances. New York: Cambridge Univ Press, v. 3, n. 1-2, p. 73-78, 2018.
dc.identifier.doi10.1557/adv.2018.66
dc.identifier.issn2059-8521
dc.identifier.urihttp://hdl.handle.net/11449/160164
dc.identifier.wosWOS:000427715200012
dc.language.isoeng
dc.publisherCambridge Univ Press
dc.relation.ispartofMrs Advances
dc.rights.accessRightsAcesso abertopt
dc.sourceWeb of Science
dc.titleImproving Graphene-metal Contacts: Thermal Induced Polishingen
dc.typeArtigopt
dcterms.licensehttp://journals.cambridge.org/action/displaySpecialPage?pageId=4676
dcterms.rightsHolderCambridge Univ Press
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Geociências e Ciências Exatas, Rio Claropt

Arquivos