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Advancing photopolymerization and 3D printing: High-Performance NiII complexes bearing N2O2 Schiff-base ligands as photocatalysts

dc.contributor.authorPesqueira, Naralyne M. [UNESP]
dc.contributor.authorMorlet-Savary, Fabrice
dc.contributor.authorSchmitt, Michael
dc.contributor.authorCarvalho-Jr, Valdemiro P. [UNESP]
dc.contributor.authorGoi, Beatriz E. [UNESP]
dc.contributor.authorLalevée, Jacques
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionCNRS
dc.contributor.institutionUniversité de Strasbourg
dc.date.accessioned2025-04-29T18:37:33Z
dc.date.issued2024-08-07
dc.description.abstractNew high-performance photocatalysts based on metal structures are being developed for polymerization. However, using low-cost metals while ensuring effectiveness is challenging. In this study, two NiII complexes NiL1 and NiL2 were synthesized using N2O2 Schiff-base ligands bearing π-extended rings (naphthaldehyde (H2L1) and phenylsalicylaldehyde (H2L2) groups), respectively. These complexes were characterized by FTIR, UV–Vis and 1H NMR spectroscopy, elemental analysis, cyclic voltammetry, and MALDI-TOF mass spectrometry. NiL1 and NiL2 were evaluated in photoinitiating system as new photocatalysts for the Free Radical Photopolymerization of Ethoxylated (3) Trimethylolpropane Triacrylate (TMPETA) for violet and green light. Three-component systems were employed in the presence of Di-tert-butyl-diphenyl iodonium hexafluorophosphate (Iod) and ethyl dimethylaminobenzoate (EDB). The absorption, luminescence, and redox properties of nickel complexes and ligands were explored and compared for a better understanding of their structure/reactivity relationship. The designed nickel complexes showed good photoinitiation abilities. NiL2 exhibited the highest monomer conversion, and it was investigated in the on–off process under green light irradiation, demonstrating the efficiency of the system in reactivating the polymerization process. An oxidative pathway mechanism was proposed based on free energy, steady state photolysis and electron spin resonance spin trapping experiments. The best system was successfully applied in cationic photopolymerization and 3D printing.en
dc.description.affiliationFaculdade de Ciências e Tecnologia UNESP – Univ. Estadual Paulista, CEP 19060-900, SP
dc.description.affiliationUniversité de Haute-Alsace CNRS, IS2M UMR 7361
dc.description.affiliationUniversité de Strasbourg, 4 Rue Blaise Pascal
dc.description.affiliationUnespFaculdade de Ciências e Tecnologia UNESP – Univ. Estadual Paulista, CEP 19060-900, SP
dc.description.sponsorshipUniversity of Texas at Austin
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2021/11741-8
dc.description.sponsorshipIdFAPESP: 2021/11873-1
dc.description.sponsorshipIdFAPESP: 2021/13128-1
dc.description.sponsorshipIdFAPESP: 2022/16213-2
dc.identifierhttp://dx.doi.org/10.1016/j.eurpolymj.2024.113279
dc.identifier.citationEuropean Polymer Journal, v. 216.
dc.identifier.doi10.1016/j.eurpolymj.2024.113279
dc.identifier.issn0014-3057
dc.identifier.scopus2-s2.0-85197306911
dc.identifier.urihttps://hdl.handle.net/11449/298583
dc.language.isoeng
dc.relation.ispartofEuropean Polymer Journal
dc.sourceScopus
dc.subject3D printing
dc.subjectFree radical photopolymerization
dc.subjectNickel complex
dc.subjectPhotochemistry
dc.subjectSchiff-base
dc.titleAdvancing photopolymerization and 3D printing: High-Performance NiII complexes bearing N2O2 Schiff-base ligands as photocatalystsen
dc.typeArtigopt
dspace.entity.typePublication
relation.isOrgUnitOfPublicationbbcf06b3-c5f9-4a27-ac03-b690202a3b4e
relation.isOrgUnitOfPublication.latestForDiscoverybbcf06b3-c5f9-4a27-ac03-b690202a3b4e
unesp.author.orcid0000-0003-2581-9373[1]
unesp.author.orcid0000-0003-4369-7824[5]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Ciências e Tecnologia, Presidente Prudentept

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