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Impact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspective

dc.contributor.authorBordallo, Caio C. M.
dc.contributor.authorSivieri, Victor B.
dc.contributor.authorMartino, Joao Antonio
dc.contributor.authorAgopian, Paula G. D. [UNESP]
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandooren, Anne
dc.contributor.authorSimoen, Eddy
dc.contributor.authorThean, Aaron Voon-Yew
dc.contributor.authorClaeys, Cor
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionIMEC
dc.contributor.institutionKatholieke Univ Leuven
dc.date.accessioned2018-11-26T15:30:03Z
dc.date.available2018-11-26T15:30:03Z
dc.date.issued2016-07-01
dc.description.abstractIn this work, the impact of the diameter on vertical nanowire tunnel field effect transistors is analyzed focusing on the conduction mechanism and analog parameters, considering different conduction regimes. The diameter influence is investigated using experimental and simulation data. The impact of the diameter on the analog parameters is analyzed, considering both weak and strong conduction. For a smaller diameter, the impact of band-to-band tunneling (BTBT) on the device characteristics increases, showing opposite trends for weak and strong conduction. For strong conduction, a degradation of the intrinsic voltage gain occurs for very small diameters, because the device has less available area for the occurrence of tunneling. For weak conduction, the reduction of the diameter increases the BTBT along the channel/source junction without showing this degradation.en
dc.description.affiliationUniv Sao Paulo, BR-05508010 Sao Paulo, Brazil
dc.description.affiliationSao Paulo State Univ, BR-01049010 Sao Joao Da Boa Vista, Brazil
dc.description.affiliationIMEC, B-3010 Leuven, Belgium
dc.description.affiliationKatholieke Univ Leuven, Dept Elect Engn, B-3001 Leuven, Belgium
dc.description.affiliationUnespSao Paulo State Univ, BR-01049010 Sao Joao Da Boa Vista, Brazil
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipimec's Logic Device Program
dc.format.extent2930-2935
dc.identifierhttp://dx.doi.org/10.1109/TED.2016.2559580
dc.identifier.citationIeee Transactions On Electron Devices. Piscataway: Ieee-inst Electrical Electronics Engineers Inc, v. 63, n. 7, p. 2930-2935, 2016.
dc.identifier.doi10.1109/TED.2016.2559580
dc.identifier.fileWOS:000378607100045.pdf
dc.identifier.issn0018-9383
dc.identifier.lattes0496909595465696
dc.identifier.orcid0000-0002-0886-7798
dc.identifier.urihttp://hdl.handle.net/11449/158936
dc.identifier.wosWOS:000378607100045
dc.language.isoeng
dc.publisherIeee-inst Electrical Electronics Engineers Inc
dc.relation.ispartofIeee Transactions On Electron Devices
dc.relation.ispartofsjr0,839
dc.rights.accessRightsAcesso abertopt
dc.sourceWeb of Science
dc.subjectAnalog performance
dc.subjectband-to-band tunneling (BTBT)
dc.subjectconduction mechanism
dc.subjecttunnel field effect transistor (TFET)
dc.titleImpact of the NW-TFET Diameter on the Efficiency and the Intrinsic Voltage Gain From a Conduction Regime Perspectiveen
dc.typeArtigopt
dcterms.licensehttp://www.ieee.org/publications_standards/publications/rights/rights_policies.html
dcterms.rightsHolderIeee-inst Electrical Electronics Engineers Inc
dspace.entity.typePublication
unesp.author.lattes0496909595465696[4]
unesp.author.orcid0000-0002-0886-7798[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, São João da Boa Vistapt

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