Low-frequency and random telegraph noise performance of Ge-based and III-V devices on a Si platform
| dc.contributor.author | Claeys, Cor | |
| dc.contributor.author | Agopian, Paula [UNESP] | |
| dc.contributor.author | Alian, Alirezza | |
| dc.contributor.author | Arimura, Hiroaki | |
| dc.contributor.author | Fang, Wen | |
| dc.contributor.author | Martino, Joao | |
| dc.contributor.author | Mitard, Jerome | |
| dc.contributor.author | Neves, Felipe | |
| dc.contributor.author | Oliviera, Alberto | |
| dc.contributor.author | Simoen, Eddy | |
| dc.contributor.institution | Imec | |
| dc.contributor.institution | KU Leuven | |
| dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
| dc.contributor.institution | Universidade de São Paulo (USP) | |
| dc.contributor.institution | Microsystem and Terahertz Research Center | |
| dc.contributor.institution | Ghent University | |
| dc.date.accessioned | 2018-12-11T16:49:13Z | |
| dc.date.available | 2018-12-11T16:49:13Z | |
| dc.date.issued | 2017-07-31 | |
| dc.description.abstract | This review demonstrates the potential of low frequency noise diagnostics for the characterization of Ge-based and III-V technologies processed on a Si platform. The analysis of traps in both gate dielectrics and semiconductor films is illustrated for state-of-the-art devices. | en |
| dc.description.affiliation | Imec | |
| dc.description.affiliation | E.E. Dept. KU Leuven | |
| dc.description.affiliation | UNESP Univ Estadual Paulista | |
| dc.description.affiliation | LSI/PSI/USP University of Sao Paulo | |
| dc.description.affiliation | Microsystem and Terahertz Research Center | |
| dc.description.affiliation | Dept. Solid-State Physics Ghent University | |
| dc.description.affiliationUnesp | UNESP Univ Estadual Paulista | |
| dc.format.extent | 288-293 | |
| dc.identifier | http://dx.doi.org/10.1109/ICSICT.2016.7998900 | |
| dc.identifier.citation | 2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings, p. 288-293. | |
| dc.identifier.doi | 10.1109/ICSICT.2016.7998900 | |
| dc.identifier.lattes | 0496909595465696 | |
| dc.identifier.orcid | 0000-0002-0886-7798 | |
| dc.identifier.scopus | 2-s2.0-85028681516 | |
| dc.identifier.uri | http://hdl.handle.net/11449/170089 | |
| dc.language.iso | eng | |
| dc.relation.ispartof | 2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings | |
| dc.rights.accessRights | Acesso aberto | |
| dc.source | Scopus | |
| dc.title | Low-frequency and random telegraph noise performance of Ge-based and III-V devices on a Si platform | en |
| dc.type | Trabalho apresentado em evento | |
| dspace.entity.type | Publication | |
| unesp.author.lattes | 0496909595465696[2] | |
| unesp.author.orcid | 0000-0002-0886-7798[2] |
