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Publicação:
Effects of annealing on the crystallization and roughness of PLZT thin films

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorGonzalez, AHM
dc.contributor.authorZaghete, M. A.
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.authorStojanovic, B. D.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversity of Belgrade
dc.date.accessioned2014-05-20T14:17:56Z
dc.date.available2014-05-20T14:17:56Z
dc.date.issued2001-03-01
dc.description.abstractLead lanthanum zirconate titanate (PLZT) thin films with stoichiometry (9/65/35) were prepared by a dip-coating process using a polymeric organic solution. The solution viscosity was adjusted in the range of 15-56 cP. Silicon (100) substrates were previously cleaned and then immersed in the solution. The withdrawal speed of substrate from the solution was adjusted within a range of 5 to 20 mm/min. The coated substrates were thermally treated in the 450-700 degreesC temperature range. Surface roughness and crystallization of these films are strongly dependent on the annealing conditions. Infrared and X-ray diffraction data for PLZT powders heat-treated at 650 degreesC for 3 h show that the material is free of carbonate phases and crystalline. (C) 2001 Elsevier B.V. B.V. All rights reserved.en
dc.description.affiliationUNESP, Dept Phys Chem, Inst Chem, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUniv Belgrade, Ctr Multidisciplinary Studies, Belgrade, Serbia Monteneg
dc.description.affiliationUnespUNESP, Dept Phys Chem, Inst Chem, BR-14801970 Araraquara, SP, Brazil
dc.format.extent132-137
dc.identifierhttp://dx.doi.org/10.1016/S0040-6090(00)01782-X
dc.identifier.citationThin Solid Films. Lausanne: Elsevier B.V. Sa, v. 384, n. 1, p. 132-137, 2001.
dc.identifier.doi10.1016/S0040-6090(00)01782-X
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/11449/25375
dc.identifier.wosWOS:000167437500019
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofThin Solid Films
dc.relation.ispartofjcr1.939
dc.relation.ispartofsjr0,617
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectannealingpt
dc.subjectcrystallizationpt
dc.subjectsurface roughnesspt
dc.subjectx-ray diffractionpt
dc.titleEffects of annealing on the crystallization and roughness of PLZT thin filmsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes3573363486614904[1]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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