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Influence of anion hardness in (001) surface of CsPbX3 (X = F, Cl, Br and I) halide perovskites

dc.contributor.authorLaranjeira, José A.S. [UNESP]
dc.contributor.authorAzevedo, Sérgio A. [UNESP]
dc.contributor.authorFabris, Guilherme S.L.
dc.contributor.authorAlbuquerque, Anderson R.
dc.contributor.authorFerrer, Mateus M.
dc.contributor.authorSambrano, Julio R. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionFederal Institute of Maranhão
dc.contributor.institutionFederal University of Pelotas
dc.contributor.institutionFederal University of Rio Grande Do Norte
dc.date.accessioned2025-04-29T20:06:35Z
dc.date.issued2023-10-01
dc.description.abstractComputational simulations play a significant role in material science, determining material properties, developing new materials, and unveiling their technological applications, including studying halide perovskites. This family of compounds is considered promising for use in photovoltaic cells and light-emitting devices. Understanding surface-dependent properties at the nanoscale is crucial because they can differ significantly from those observed on the macroscale. Taking into this account, the present study utilized DFT/HSE06 approach to elaborate a computational model of CsPbX3 (X = F, Cl, Br, and I) compounds and their (001) surfaces. This research found that anion X− hardness strongly influences surface stability, cluster distortions, band gap energy, and carrier mobility. PbX2 surface termination is most stable when X = F, while CsX termination is most stable when X = Cl, Br, and I. According to the anion hardness decrease, outermost clusters in CsX terminations become distorted, and an inverse behavior is observed for PbX2 terminations. The CsPbX3 (001) surfaces exhibit a direct band gap at the R point, characterized by a significant concentration of electronic states below the Fermi level. Furthermore, it has been observed that the anion hardness is crucial to the availability of bands near the band gap, with a decrease in hardness increasing in available electronic states. The band gap energy (Egap) of PbX2 is slightly larger than that of CsX terminations. In the outermost layers for CsX terminations, significantly larger areas of negative potential occur than the PbX2. These results provide valuable insights into designing and optimizing nanoscale halide perovskites for various applications.en
dc.description.affiliationModeling and Molecular Simulation Group São Paulo State University, SP
dc.description.affiliationFederal Institute of Maranhão, Ma
dc.description.affiliationPostgraduate Program in Materials Science and Engineering Federal University of Pelotas, RS
dc.description.affiliationChemistry Institute Federal University of Rio Grande Do Norte, RN
dc.description.affiliationUnespModeling and Molecular Simulation Group São Paulo State University, SP
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado do Rio Grande do Sul
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipIdCNPq: 150187/2023–8
dc.description.sponsorshipIdFAPESP: 22/03959–6
dc.description.sponsorshipIdCAPES: 88887.827928/2023–00
dc.identifierhttp://dx.doi.org/10.1016/j.jssc.2023.124181
dc.identifier.citationJournal of Solid State Chemistry, v. 326.
dc.identifier.doi10.1016/j.jssc.2023.124181
dc.identifier.issn1095-726X
dc.identifier.issn0022-4596
dc.identifier.scopus2-s2.0-85164217715
dc.identifier.urihttps://hdl.handle.net/11449/306565
dc.language.isoeng
dc.relation.ispartofJournal of Solid State Chemistry
dc.sourceScopus
dc.subjectCsPbX3
dc.subjectHalide
dc.subjectInorganic
dc.subjectPerovskite
dc.subjectSurface
dc.titleInfluence of anion hardness in (001) surface of CsPbX3 (X = F, Cl, Br and I) halide perovskitesen
dc.typeArtigopt
dspace.entity.typePublication
unesp.author.orcid0000-0002-5289-4101 0000-0002-5289-4101[2]
unesp.author.orcid0000-0002-0484-0192[5]
unesp.author.orcid0000-0002-5217-7145[6]

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