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Impedance of carrier injection at the metal-organic interface mediated by surface states in electron-only tris(8-hydroxyquinoline) aluminium (Alq(3)) thin layers

dc.contributor.authorGarcia-Belmonte, Germa
dc.contributor.authorBisquert, Juan
dc.contributor.authorBueno, Paulo R. [UNESP]
dc.contributor.authorGraeff, Carlos Frederico de Oliveira [UNESP]
dc.contributor.institutionUniv Jaume 1
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T13:26:19Z
dc.date.available2014-05-20T13:26:19Z
dc.date.issued2008-04-10
dc.description.abstractCapacitance spectra of thin (< 200 nm) Alq(3) electron-only devices have been measured as a function of bias voltage. Capacitance spectra exhibit a flat response at high frequencies (> 10(3) Hz) and no feature related to the carrier transit time is observed. Toward low frequencies the spectra reach a maximum and develop a negative excess capacitance. Capacitance response along with current-voltage (J-V) characteristics are interpreted in terms of the injection of electrons mediated by surface states at the metal organic interface. A detailed model for the impedance of the injection process is provided that highlights the role of the filling/releasing kinetics of energetically distributed interface states. This approach connects the whole capacitance spectra to the occupancy of interface states, with no additional information about bulk trap levels. Simulations based on the model allow to derive the density of interface states effectively intervening in the carrier injection (similar to 1.5 x 10(12) cm (2)). (C) 2008 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Jaume 1, Dept Fis, E-12071 Castellon de La Plana, Spain
dc.description.affiliationUniv Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.description.affiliationUNESP, Dept Fis, Fac Ciencias, BR-17033360 Bauru, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.description.affiliationUnespUNESP, Dept Fis, Fac Ciencias, BR-17033360 Bauru, Brazil
dc.format.extent242-248
dc.identifierhttp://dx.doi.org/10.1016/j.cplett.2008.02.076
dc.identifier.citationChemical Physics Letters. Amsterdam: Elsevier B.V., v. 455, n. 4-6, p. 242-248, 2008.
dc.identifier.doi10.1016/j.cplett.2008.02.076
dc.identifier.issn0009-2614
dc.identifier.orcid0000-0003-0162-8273
dc.identifier.urihttp://hdl.handle.net/11449/8464
dc.identifier.wosWOS:000255552800023
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofChemical Physics Letters
dc.relation.ispartofjcr1.686
dc.relation.ispartofsjr0,656
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.titleImpedance of carrier injection at the metal-organic interface mediated by surface states in electron-only tris(8-hydroxyquinoline) aluminium (Alq(3)) thin layersen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes5268607684223281[4]
unesp.author.orcid0000-0003-2827-0208[3]
unesp.author.orcid0000-0003-0162-8273[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Ciências, Baurupt
unesp.departmentFísica - FCpt

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