Fabrication and characterization of GeO2-PbO optical waveguides
dc.contributor.author | Cacho, V. D D | |
dc.contributor.author | Kassab, L. R P [UNESP] | |
dc.contributor.author | Dos Santos, A. D. | |
dc.contributor.author | Siarkowski, A. L. | |
dc.contributor.author | Da Silva, D. M. | |
dc.contributor.author | Morimoto, N. I. | |
dc.contributor.institution | Universidade de São Paulo (USP) | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-27T11:24:04Z | |
dc.date.available | 2014-05-27T11:24:04Z | |
dc.date.issued | 2009-12-01 | |
dc.description.abstract | This work presents studies of GeO2-PbO thin films deposited by RF Sputtering for fabrication of rib-waveguide. GeO2-PbO vitreous targets were prepared melting the reagents in alumina crucible. Thin films were deposited at room temperature using pure Ar plasma, at 5 mTorr pressure and RF power of 40 W on substrates of (100) silicon wafers. Rutherford Backscattering Spectroscopy (RBS) analyses were employed for the determination of the chemical elements present in the GeO2-PbO film. Geometry and sidewall of the waveguides were investigated by Scanning Electron Microscopy (SEM). The mode propagation in the waveguide structure of GeO2-PbO thin films was analyzed using an integrated optic simulation software to obtain a monomode propagation. © The Electrochemical Society. | en |
dc.description.affiliation | Departamento de Engenharia de Sistemas Eletrônicos Escola Politécnica Universidade de São Paulo, São Paulo, SP | |
dc.description.affiliation | Laboratório de Vidros e Datação Faculdade de Tecnologia de São Paulo CEETEPS/UNESP, São Paulo, SP | |
dc.description.affiliation | Laboratório de Materiais Magnéticos Instituto de Fisica Universidade de São Paulo, São Paulo, SP | |
dc.description.affiliationUnesp | Laboratório de Vidros e Datação Faculdade de Tecnologia de São Paulo CEETEPS/UNESP, São Paulo, SP | |
dc.format.extent | 507-513 | |
dc.identifier | http://dx.doi.org/10.1149/1.3183757 | |
dc.identifier.citation | ECS Transactions, v. 23, n. 1, p. 507-513, 2009. | |
dc.identifier.doi | 10.1149/1.3183757 | |
dc.identifier.issn | 1938-5862 | |
dc.identifier.issn | 1938-6737 | |
dc.identifier.scopus | 2-s2.0-74549185201 | |
dc.identifier.uri | http://hdl.handle.net/11449/71312 | |
dc.language.iso | eng | |
dc.relation.ispartof | ECS Transactions | |
dc.relation.ispartofsjr | 0,225 | |
dc.relation.ispartofsjr | 0,225 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Scopus | |
dc.subject | Alumina crucible | |
dc.subject | Ar plasmas | |
dc.subject | Mode propagation | |
dc.subject | Rf-power | |
dc.subject | Rf-sputtering | |
dc.subject | Room temperature | |
dc.subject | SEM | |
dc.subject | Simulation software | |
dc.subject | Waveguide structure | |
dc.subject | Chemical elements | |
dc.subject | Computer software | |
dc.subject | Microelectronics | |
dc.subject | Rutherford backscattering spectroscopy | |
dc.subject | Scanning electron microscopy | |
dc.subject | Semiconducting silicon compounds | |
dc.subject | Silicon wafers | |
dc.subject | Thin films | |
dc.subject | Waveguides | |
dc.title | Fabrication and characterization of GeO2-PbO optical waveguides | en |
dc.type | Trabalho apresentado em evento | |
dcterms.license | http://www.electrochem.org/dl/support/assets/crtf.pdf | |
dspace.entity.type | Publication |