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A sub-1 V, Electrolyte-Gated Vertical Field Effect Transistor based on ZnO/AgNW Schottky contact

dc.contributor.authorNogueira, Gabriel L.
dc.contributor.authorVieira, Douglas H.
dc.contributor.authorMorais, Rogerio M.
dc.contributor.authorSerbena, Jose P. M.
dc.contributor.authorSeidel, Keli F.
dc.contributor.authorAlves, Neri
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionUniversidade Federal do Paraná (UFPR)
dc.date.accessioned2022-04-29T08:46:02Z
dc.date.available2022-04-29T08:46:02Z
dc.date.issued2021-01-01
dc.description.abstractFew works on solution-processed zinc oxide vertical transistors and electrolyte-gated transistors have shown the merits of both architectures. Here, we present an electrolyte-gated vertical field-effect transistor (EGVFET) based on a spray-deposited zinc oxide/silver nanowire (ZnO/AgNW) Schottky contact. The output curve shows that the device operates at a sub-1 V bias. Also, the electrolyte does not affect the diode cell, and the cyclic voltammetry of the capacitor cell does not indicate a faradic process between AgNW and the top-gate electrode. From the transfer curve, we extracted an ION/IOFF ratio of 104, an on-current density of 65.3 mA/cm2 and a normalized transconductance of 113.4 S/cm2. Our contribution places the ZnO-EGVFET structure on the front line to develop printed transistors without a high-resolution pattern.en
dc.description.affiliationSão Paulo State University – UNESP, Faculty of Science and Technology (FCT), Physics Department, Presidente Prudente, SP, Brazil. (e-mail: leonardo.nogueira@unesp.br)
dc.description.affiliationSão Paulo State University – UNESP, Faculty of Science and Technology (FCT), Physics Department, Presidente Prudente, SP, Brazil.
dc.description.affiliationUniversidade Federal do Paraná – UFPR, Physics Department, Curitiba, PR, Brazil.
dc.description.affiliationUniversidade Tecnológica Federal Do Paraná – UTFPR, Physics Department, Curitiba, PR, Brazil.
dc.identifierhttp://dx.doi.org/10.1109/LED.2021.3120928
dc.identifier.citationIEEE Electron Device Letters.
dc.identifier.dimensionspub.1141919624
dc.identifier.doi10.1109/LED.2021.3120928
dc.identifier.issn1558-0563
dc.identifier.issn0741-3106
dc.identifier.orcid0000-0002-4184-0394
dc.identifier.orcid0000-0002-1618-0873
dc.identifier.orcid0000-0003-4286-5064
dc.identifier.orcid0000-0001-8001-301X
dc.identifier.orcid0000-0001-9164-9697
dc.identifier.orcid0000-0002-2813-5842
dc.identifier.scopus2-s2.0-85117765402
dc.identifier.urihttp://hdl.handle.net/11449/231538
dc.language.isoeng
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)
dc.relation.ispartofIEEE Electron Device Letters
dc.rights.accessRightsAcesso abertopt
dc.rights.sourceRightsoa_all
dc.rights.sourceRightsgreen
dc.sourceScopus
dc.sourceDimensions
dc.subjectField-effect transistor
dc.subjectSchottky diode
dc.subjectSpray-coating
dc.subjectVertical electrolyte-gated transistor
dc.titleA sub-1 V, Electrolyte-Gated Vertical Field Effect Transistor based on ZnO/AgNW Schottky contacten
dc.typeArtigopt
dspace.entity.typePublication
unesp.departmentEstatística - FCTpt

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