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Charge-trap memory effect in spray deposited ZnO-based electrolyte-gated transistors operating at low voltage

dc.contributor.authorVieira, Douglas Henrique [UNESP]
dc.contributor.authorNogueira, Gabriel Leonardo [UNESP]
dc.contributor.authorNascimento, Mayk Rodrigues [UNESP]
dc.contributor.authorFugikawa-Santos, Lucas [UNESP]
dc.contributor.authorAlves, Neri [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.date.accessioned2025-04-29T18:57:09Z
dc.date.issued2023-09-01
dc.description.abstractCharge-trap memory phenomena were demonstrated in an electrolyte-gated transistor (EGT) using a spray-coated zinc oxide (ZnO) active layer and a cellulose-based electrolyte. The EGT exhibited efficient programming and erasing characteristics at low voltages, shifting the threshold voltage and the magnitude of the on-current. This behavior is discussed in terms of the influence of charged trapping states at the ZnO/electrolyte interface and within the ZnO bulk. The presence of these traps leads to a shift in the mobility from 0.57 ± 0.16 cm2 V−1 s−1 in the initial state to 0.02 ± 0.01 cm2 V−1 s−1 when programmed. Retention experiments revealed improved stability of the memory state when a low positive voltage is applied to the gate, indicating that the device's characteristics are extremely sensitive to the trapping/detrapping of charges at the semiconductor/electrolyte interface. Capacitance spectroscopy measurements using planar and metal-insulator-semiconductor configurations within the same device were used to analyze the charging dynamics of the trap states at different programming states.en
dc.description.affiliationSão Paulo State University – UNESP Physics Department, SP
dc.description.affiliationSão Paulo State University – UNESP Institute of Geosciences and Exact Sciences (IGCE) Physics Department, SP
dc.description.affiliationUnespSão Paulo State University – UNESP Physics Department, SP
dc.description.affiliationUnespSão Paulo State University – UNESP Institute of Geosciences and Exact Sciences (IGCE) Physics Department, SP
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipInstituto Nacional de Ciência e Tecnologia em Eletrônica Orgânica
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2019/08019-9
dc.description.sponsorshipIdFAPESP: 2020/12282-4
dc.format.extent118-125
dc.identifierhttp://dx.doi.org/10.1016/j.cap.2023.06.012
dc.identifier.citationCurrent Applied Physics, v. 53, p. 118-125.
dc.identifier.doi10.1016/j.cap.2023.06.012
dc.identifier.issn1567-1739
dc.identifier.scopus2-s2.0-85164668789
dc.identifier.urihttps://hdl.handle.net/11449/301073
dc.language.isoeng
dc.relation.ispartofCurrent Applied Physics
dc.sourceScopus
dc.subjectCharge-trap memory
dc.subjectLow voltage
dc.subjectSpray-coating
dc.subjectTransistor
dc.titleCharge-trap memory effect in spray deposited ZnO-based electrolyte-gated transistors operating at low voltageen
dc.typeArtigopt
dspace.entity.typePublication
unesp.author.orcid0000-0002-2813-5842[1]
unesp.author.orcid0000-0001-9164-9697[2]
unesp.author.orcid0000-0002-7816-4561[3]
unesp.author.orcid0000-0001-8001-301X[5]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Geociências e Ciências Exatas, Rio Claropt

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