Publicação: Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface
dc.contributor.author | Basho, É N. | |
dc.contributor.author | Sakai, R. T. | |
dc.contributor.author | Da Cruz, F. M D L [UNESP] | |
dc.contributor.author | De Melo, H. G. | |
dc.contributor.author | Benedetti, Assis Vicente [UNESP] | |
dc.contributor.author | Suegama, P. H. | |
dc.contributor.institution | Universidade Federal da Grande Dourados (UFGD) | |
dc.contributor.institution | Universidade de São Paulo (USP) | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-27T11:27:19Z | |
dc.date.available | 2014-05-27T11:27:19Z | |
dc.date.issued | 2012-12-01 | |
dc.description.abstract | This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society. | en |
dc.description.affiliation | Faculdade de Ciências Exatas e Tecnologia UFGD, Dourados, MS | |
dc.description.affiliation | Departamento de Engenharia Química Escola Politécnica USP, São Paulo, SP | |
dc.description.affiliation | Departamento de Físico-Química Instituto de Química UNESP, Araraquara, SP | |
dc.description.affiliationUnesp | Departamento de Físico-Química Instituto de Química UNESP, Araraquara, SP | |
dc.format.extent | 3-7 | |
dc.identifier | http://dx.doi.org/10.1149/1.4704931 | |
dc.identifier.citation | ECS Transactions, v. 43, n. 1, p. 3-7, 2012. | |
dc.identifier.doi | 10.1149/1.4704931 | |
dc.identifier.issn | 1938-5862 | |
dc.identifier.issn | 1938-6737 | |
dc.identifier.scopus | 2-s2.0-84879436516 | |
dc.identifier.uri | http://hdl.handle.net/11449/73842 | |
dc.language.iso | eng | |
dc.relation.ispartof | ECS Transactions | |
dc.relation.ispartofsjr | 0,225 | |
dc.relation.ispartofsjr | 0,225 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Scopus | |
dc.subject | Copper surface | |
dc.subject | Dip-coating process | |
dc.subject | Low concentrations | |
dc.subject | Open circuit potential | |
dc.subject | Polarization curves | |
dc.subject | Substrate degradation | |
dc.subject | Copper | |
dc.subject | Degradation | |
dc.subject | Electrochemical impedance spectroscopy | |
dc.subject | Electrochemistry | |
dc.subject | Silicon compounds | |
dc.subject | Silicones | |
dc.subject | Coatings | |
dc.title | Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface | en |
dc.type | Trabalho apresentado em evento | |
dcterms.license | http://www.electrochem.org/dl/support/assets/crtf.pdf | |
dspace.entity.type | Publication | |
unesp.author.lattes | 1769008264876945[5] | |
unesp.author.orcid | 0000-0002-0243-6639[5] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Físico-Química - IQAR | pt |