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Molecular architecture of thin films fabricated via physical vapor deposition and containing a poly(azo)urethane

dc.contributor.authorAlessio, Priscila [UNESP]
dc.contributor.authorLeopoldo Constantino, Carlos Jose [UNESP]
dc.contributor.authorJob, Aldo Eloizo [UNESP]
dc.contributor.authorAroca, Ricardo
dc.contributor.authorPerez Gonzalez, Eduardo Rene [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniv Windsor
dc.date.accessioned2014-05-20T13:23:04Z
dc.date.available2014-05-20T13:23:04Z
dc.date.issued2010-05-01
dc.description.abstractOrganic thin films are widely applied as transducers in devices whose performance is determined by the optical and electrical properties of the films. In this context, the molecular architecture of the thin films plays an important role. In this work we report the fabrication and characterization of a poly(azo)urethane synthesized fixing CO(2) in bis-epoxide followed by a copolymerization reaction with an azodiamine without using isocyanate. The poly(azo)urethane thin films were fabricated by physical vapor deposition (PVD) technique using vacuum thermal evaporation. The molecular architecture of the PVD films was investigated under control growth at nanometer level of thickness, as well as the surface morphology at micro and nanometer scales and the molecular organization. The thermal stability of the poly(azo)urethane molecules, which is a challenge in itself considering the thermal evaporation process, was followed by thermogravimetric analysis (TG) and also by both Fourier transform infrared absorption (FTIR) and ultraviolet-visible (UV-vis) absorption spectroscopies. The UV-vis absorption spectra showed a linear growth of the absorbance of the PVD films with the mass thickness measured by a quartz crystal balance. A random distribution of the poly(azo)urethane molecules in the PVD films was revealed by FTIR spectra. The film morphology was investigated at microscopic level combining chemical and topographical information through micro-Raman technique. At nanoscopic scale, the morphology was investigated by atomic force microscopy (AFM) for films fabricated using distinct evaporation rates. As a proof of principle (for potential applications), the film luminescence was measured over a wide range of temperature. Interestingly, an unusual increase of fluorescence intensity was observed at +150 degrees C after a monotonic decrease from -150 degrees C.en
dc.description.affiliationUNESP, Fac Ciencias & Tecnol, Dept Fis Quim & Biol, BR-19060900 Presidente Prudente, SP, Brazil
dc.description.affiliationUniv Windsor, Mat & Surface Sci Grp, Windsor, on N9B 3P4, Canada
dc.description.affiliationUnespUNESP, Fac Ciencias & Tecnol, Dept Fis Quim & Biol, BR-19060900 Presidente Prudente, SP, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipNatural Sciences and Engineering Research Council of Canada (NSERC)
dc.format.extent3012-3021
dc.identifierhttp://dx.doi.org/10.1166/jnn.2010.1923
dc.identifier.citationJournal of Nanoscience and Nanotechnology. Stevenson Ranch: Amer Scientific Publishers, v. 10, n. 5, p. 3012-3021, 2010.
dc.identifier.doi10.1166/jnn.2010.1923
dc.identifier.issn1533-4880
dc.identifier.lattes6475585105456744
dc.identifier.lattes5943919093617181
dc.identifier.lattes9727122203219263
dc.identifier.orcid0000-0002-1345-0540
dc.identifier.urihttp://hdl.handle.net/11449/6891
dc.identifier.wosWOS:000275626200008
dc.language.isoeng
dc.publisherAmer Scientific Publishers
dc.relation.ispartofJournal of Nanoscience and Nanotechnology
dc.relation.ispartofjcr1.354
dc.relation.ispartofsjr0,326
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectPoly(azo)Urethaneen
dc.subjectCO(2) Fixationen
dc.subjectPVD Thin Filmsen
dc.subjectAFMen
dc.subjectMicro-Ramanen
dc.titleMolecular architecture of thin films fabricated via physical vapor deposition and containing a poly(azo)urethaneen
dc.typeArtigo
dcterms.licensehttp://www.aspbs.com/jnn/JNN%20Copyright%20Transfer%20Form.pdf
dcterms.rightsHolderAmer Scientific Publishers
dspace.entity.typePublication
unesp.author.lattes6475585105456744[3]
unesp.author.lattes5943919093617181
unesp.author.lattes9727122203219263[1]
unesp.author.lattes6118325967319836[2]
unesp.author.orcid0000-0002-1979-8257[3]
unesp.author.orcid0000-0002-1345-0540[1]
unesp.author.orcid0000-0002-5921-3161[2]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Ciências e Tecnologia, Presidente Prudentept
unesp.departmentFísica, Química e Biologia - FCTpt

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