Publicação: Reactive sputtering deposition of Co3O4 films and an evaluation of its use as an electrochemical sensor for ascorbic acid
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2022-08-01
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Co3O4 films have been deposited using reactive DC magnetron sputtering onto fluorine-doped tin oxide (FTO) and fused silica (SiO2). X-ray diffraction measurements confirmed the spinel Co3O4 phase. The surface roughness of the films were 4 nm and 20 nm for SiO2 and FTO substrates, respectively, as measured by atomic force microscopy. Optical transmission spectra of Co3O4 films show strong absorption in the near-infrared and visible regions. The photoconductivity response of SiO2/Co3O4, using 405 nm excitation, measured at room temperature is much smaller than the observed at 10 K. The electrochemical activity of the FTO/Co3O4 for the oxidation reaction of the ascorbic acid (AA) was investigated by differential pulse voltammetry and chronoamperometric. A model for the oxidation, based on density functional theory calculations for the electronic structure of the AA, is proposed. The set of results show that the assembled FTO/Co3O4 electrode can be used as an alternative and remarkable-performance non-enzymatic device to ascorbic acid electrooxidation.
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Journal of Materials Science: Materials in Electronics, v. 33, n. 24, p. 19678-19692, 2022.
