Antimicrobial Photodynamic Inactivation Using Topical and Superhydrophobic Sensitizer Techniques: A Perspective from Diffusion in Biofilms†

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dc.contributor.authorTonon, Caroline Coradi
dc.contributor.authorAshraf, Shoaib
dc.contributor.authorAlburquerque, José Quílez
dc.contributor.authorde Souza Rastelli, Alessandra Nara [UNESP]
dc.contributor.authorHasan, Tayyaba
dc.contributor.authorLyons, Alan M.
dc.contributor.authorGreer, Alexander
dc.contributor.institutionMassachusetts General Hospital and Harvard Medical School
dc.contributor.institutionComplutense University of Madrid (UCM)
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionHarvard University and Massachusetts Institute of Technology
dc.contributor.institutionCity University of New York
dc.contributor.institutionThe Graduate Center of the City University of New York
dc.contributor.institutionSingletO2 Therapeutics LLC
dc.date.accessioned2022-04-28T19:41:27Z
dc.date.available2022-04-28T19:41:27Z
dc.date.issued2021-01-01
dc.description.abstractThis review describes nanoparticle and dye diffusion in bacterial biofilms in the context of antimicrobial photodynamic inactivation (aPDI). aPDI requires the diffusion of a photosensitizer (Sens) into the biofilm and subsequent photoactivation of oxygen for the generation of reactive oxygen species (ROS) that inactivate microbes. Molecular diffusion in biofilms has been long investigated, whereas this review is intended to draw a logical link between diffusion in biofilms and ROS, a combination that leads to the current state of aPDI and superhydrophobic aPDI (SH-aPDI). This review should be of interest to photochemists, photobiologists and researchers in material and antimicrobial sciences as is ties together conventional aPDI with the emerging subject of SH-aPDI.en
dc.description.affiliationWellman Center for Photomedicine Massachusetts General Hospital and Harvard Medical School
dc.description.affiliationDepartment of Organic Chemistry Faculty of Chemistry Complutense University of Madrid (UCM)
dc.description.affiliationDepartment of Restorative Dentistry School of Dentistry São Paulo State University-UNESP
dc.description.affiliationDivision of Health Sciences and Technology Harvard University and Massachusetts Institute of Technology
dc.description.affiliationDepartment of Chemistry College of Staten Island City University of New York
dc.description.affiliationPh.D. Program in Chemistry The Graduate Center of the City University of New York
dc.description.affiliationSingletO2 Therapeutics LLC
dc.description.affiliationDepartment of Chemistry Brooklyn College City University of New York
dc.description.affiliationUnespDepartment of Restorative Dentistry School of Dentistry São Paulo State University-UNESP
dc.identifierhttp://dx.doi.org/10.1111/php.13461
dc.identifier.citationPhotochemistry and Photobiology.
dc.identifier.doi10.1111/php.13461
dc.identifier.issn1751-1097
dc.identifier.issn0031-8655
dc.identifier.scopus2-s2.0-85109668576
dc.identifier.urihttp://hdl.handle.net/11449/221932
dc.language.isoeng
dc.relation.ispartofPhotochemistry and Photobiology
dc.sourceScopus
dc.titleAntimicrobial Photodynamic Inactivation Using Topical and Superhydrophobic Sensitizer Techniques: A Perspective from Diffusion in Biofilms†en
dc.typeResenha
unesp.author.orcid0000-0003-0058-9970[1]
unesp.author.orcid0000-0002-1218-4877[2]
unesp.author.orcid0000-0002-1149-7433[3]
unesp.author.orcid0000-0002-6768-2670[4]
unesp.author.orcid0000-0003-0871-6057[5]
unesp.author.orcid0000-0003-4410-9756[6]
unesp.author.orcid0000-0003-4444-9099[7]

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