Influence of substrate on the structure of predominantly anatase TiO2 films grown by reactive sputtering

dc.contributor.authorBrandt, Iuri S.
dc.contributor.authorPlá Cid, Cristiani C.
dc.contributor.authorAzevedo, Carlos G. G. [UNESP]
dc.contributor.authorPereira, André L. J.
dc.contributor.authorBenetti, Luana C.
dc.contributor.authorFerlauto, Andre S.
dc.contributor.authorDias Da Silva, José H. [UNESP]
dc.contributor.authorPasa, André A.
dc.contributor.institutionUniversidade Federal de Santa Catarina (UFSC)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal da Grande Dourados UFGD
dc.contributor.institutionUniversidade Federal de Minas Gerais (UFMG)
dc.description.abstractTiO2 films are grown on LaAlO3 (001), Si (100) and SiO2 substrates by reactive radio frequency sputtering. X-ray diffraction (XRD) pole figures revealed important characteristics about the texture and phase distribution on those films. Combined with spectroscopic ellipsometry, the pole figures allowed the analysis of the growth characteristics over the whole volume of the layers. Details in the microstructure of the films were probed using transmission electron spectroscopy. Anatase is the dominating phase in the films grown on all substrates. On TiO2/LaAlO3 fims, the mosaicity is very low, so that the pole figure closely resembles that of anatase monocrystals. Detailed inspection of XRD pole figures reveals a small amount of rutile in the TiO2/LaAlO3 films. For the growth of TiO2 onto SiO2, rutile and brookite phases are also detected. Transmission electron microscopy and XRD results show the formation of anatase {112} twins in films grown on the different substrates, suggesting that the anatase {112} twin mediates the growth of rutile and brookite phases. Optical results are in agreement with the XRD observations: the optical properties of TiO2/LaAlO3 films are similar to the ordinary values of bulk anatase crystals, indicating the orientation of the film in the [001] direction, whereas results for TiO2/SiO2 are compatible with lower crystalline ordering.en
dc.description.affiliationLaboratório de Filmes Finos e Superfícies Universidade Federal de Santa Catarina
dc.description.affiliationPrograma de Pós-Graduação em Ciência e Engenharia de Materiais Universidade Federal de Santa Catarina
dc.description.affiliationFaculdade de Ciências Universidade Estadual Paulista UNESP
dc.description.affiliationUniversidade Federal da Grande Dourados UFGD
dc.description.affiliationDepartamento de Física Universidade Federal de Minas Gerais
dc.description.affiliationUnespFaculdade de Ciências Universidade Estadual Paulista UNESP
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipFundação de Amparo à Pesquisa e Inovação do Estado de Santa Catarina
dc.description.sponsorshipFinanciadora de Estudos e Projetos
dc.identifier.citationRSC Advances, v. 8, n. 13, p. 7062-7071, 2018.
dc.relation.ispartofRSC Advances
dc.rights.accessRightsAcesso aberto
dc.titleInfluence of substrate on the structure of predominantly anatase TiO2 films grown by reactive sputteringen