Publicação:
Proton radiation effects on the self-aligned triple gate SOI p-type Tunnel FET output characteristic

dc.contributor.authorTorres, H. L. F.
dc.contributor.authorMartino, J. A.
dc.contributor.authorRooyackers, R.
dc.contributor.authorVandooren, A.
dc.contributor.authorSimoen, E.
dc.contributor.authorClaeys, C.
dc.contributor.authorAgopian, P. G. D. [UNESP]
dc.contributor.authorIEEE
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionIMEC
dc.contributor.institutionKatholieke Univ Leuven
dc.date.accessioned2018-11-26T15:47:35Z
dc.date.available2018-11-26T15:47:35Z
dc.date.issued2017-01-01
dc.description.abstractThis paper reports for the first time the study of radiation effects on triple gate SOI tunnel FETs. In this work, devices with 1 mu m width and three different channel lengths were exposed to a 600 keV proton radiation source and their current-voltage behavior was analyzed after 1 Mrad(Si) of accumulated total dose, comparing the results obtained before and after irradiation. It was possible to notice a drain current decrease in the shorter channel devices. However, this total dose influence was not so prominent in the longer channel ones. The reasons for both phenomena is discussed based on the competition between the drain current split and the high channel resistance.en
dc.description.affiliationUniv Sao Paulo, LSI PSI, Sao Paulo, Brazil
dc.description.affiliationSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil
dc.description.affiliationIMEC, Leuven, Belgium
dc.description.affiliationKatholieke Univ Leuven, EE Dept, Leuven, Belgium
dc.description.affiliationUnespSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.format.extent4
dc.identifier.citation2017 32nd Symposium On Microelectronics Technology And Devices (sbmicro): Chip On The Sands. New York: Ieee, 4 p., 2017.
dc.identifier.lattes0496909595465696
dc.identifier.orcid0000-0002-0886-7798
dc.identifier.urihttp://hdl.handle.net/11449/160128
dc.identifier.wosWOS:000426524500004
dc.language.isoeng
dc.publisherIeee
dc.relation.ispartof2017 32nd Symposium On Microelectronics Technology And Devices (sbmicro): Chip On The Sands
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.subjectProton radiation
dc.subjectTFET
dc.subjectSOI
dc.subjectCharacterization
dc.titleProton radiation effects on the self-aligned triple gate SOI p-type Tunnel FET output characteristicen
dc.typeTrabalho apresentado em evento
dcterms.licensehttp://www.ieee.org/publications_standards/publications/rights/rights_policies.html
dcterms.rightsHolderIeee
dspace.entity.typePublication
unesp.author.lattes0496909595465696[7]
unesp.author.orcid0000-0002-0886-7798[7]

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