Poole-Frenkel effect in Er doped SnO2 thin films deposited by sol-gel-dip-coating
Nenhuma Miniatura disponível
Data
2005-01-01
Orientador
Coorientador
Pós-graduação
Curso de graduação
Título da Revista
ISSN da Revista
Título de Volume
Editor
Wiley-Blackwell
Tipo
Artigo
Direito de acesso
Acesso restrito
Resumo
Electrical properties of Er-doped SnO2 thin films obtained by sol-gel-dip-coating technique were measured. When compared to undoped tin dioxide, rare-earth doped films present much higher resistivity, indicating that Er3+ presents an acceptor-like character into the matrix, which leads to a high degree of electric charge compensation. Current-voltage characteristics, measured above room temperature for Er-doped films, lead to non-linear behavior and two conduction regimes. In the lower electric field range the conduction is dominated by Schottky emission over the grain boundary potential barrier, which presents an average value of 0.85 eV. Increasing the applied bias, a second regime of conduction is observed, since the Poole-Frenkel coulombic barrier lowering becomes a significant effect. The obtained activation energy for ionization is 0.67 eV. (C) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Descrição
Palavras-chave
Idioma
Inglês
Como citar
Physica Status Solidi A-applied Research. Weinheim: Wiley-v C H Verlag Gmbh, v. 202, n. 2, p. 301-308, 2005.