Publication: Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node
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Abstract
This work analyzes the impact of temperature on the Analog figures of Merit of vertically stacked nanosheet nMOSFETs. The excellent electrostatic control between gate and channel results in a strong reduction of the short channel effect, as expected. The analog parameters like the intrinsic voltage gain, transistor efficiency and Early voltage are analyzed as a function of temperature. A high intrinsic voltage gain and a weak temperature dependence are observed, mainly at strong inversion region. The transistor efficiency and subthreshold swing maintain their value close to the theoretical limit.
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Analog operation, MOSFET, Nanosheets (NS)
Language
English
Citation
2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020.
