Publicação: Memristive behavior of the SnO2/TiO2 interface deposited by sol–gel
dc.contributor.author | Boratto, Miguel H. [UNESP] | |
dc.contributor.author | Ramos, Roberto A. [UNESP] | |
dc.contributor.author | Congiu, Mirko [UNESP] | |
dc.contributor.author | Graeff, Carlos F.O. [UNESP] | |
dc.contributor.author | Scalvi, Luis V.A. [UNESP] | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2018-12-11T17:31:51Z | |
dc.date.available | 2018-12-11T17:31:51Z | |
dc.date.issued | 2017-07-15 | |
dc.description.abstract | A novel and cheap Resistive Random Access Memory (RRAM) device is proposed within this work, based on the interface between antimony doped Tin Oxide (4%at Sb:SnO2) and Titanium Oxide (TiO2) thin films, entirely prepared through a low-temperature sol–gel process. The device was fabricated on glass slides using evaporated aluminum electrodes. Typical bipolar memristive behavior under cyclic voltage sweeping and square wave voltages, with well-defined high and low resistance states (HRS and LRS), and set and reset voltages are shown in our samples. The switching mechanism, explained by charges trapping/de-trapping by defects in the SnO2/TiO2 interface, is mainly driven by the external electric field. The calculated on/off ratio was about 8 × 102 in best conditions with good reproducibility over repeated measurement cycles under cyclic voltammetry and about 102 under applied square wave voltage. | en |
dc.description.affiliation | São Paulo State University (Unesp) School of Sciences POSMAT—Post-graduate program in Materials Science and Technology | |
dc.description.affiliation | São Paulo State University (Unesp) School of Sciences Department of Physics | |
dc.description.affiliationUnesp | São Paulo State University (Unesp) School of Sciences POSMAT—Post-graduate program in Materials Science and Technology | |
dc.description.affiliationUnesp | São Paulo State University (Unesp) School of Sciences Department of Physics | |
dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
dc.description.sponsorshipId | CNPq: 2016/17302-8 | |
dc.description.sponsorshipId | CAPES: 471359/2013-0 | |
dc.format.extent | 278-281 | |
dc.identifier | http://dx.doi.org/10.1016/j.apsusc.2017.03.132 | |
dc.identifier.citation | Applied Surface Science, v. 410, p. 278-281. | |
dc.identifier.doi | 10.1016/j.apsusc.2017.03.132 | |
dc.identifier.file | 2-s2.0-85015873321.pdf | |
dc.identifier.issn | 0169-4332 | |
dc.identifier.scopus | 2-s2.0-85015873321 | |
dc.identifier.uri | http://hdl.handle.net/11449/178729 | |
dc.language.iso | eng | |
dc.relation.ispartof | Applied Surface Science | |
dc.relation.ispartofsjr | 1,093 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Scopus | |
dc.subject | Memristor | |
dc.subject | Non-volatile memory | |
dc.subject | RRAM | |
dc.subject | SnO2/TiO2 | |
dc.subject | Sol–gel | |
dc.subject | Thin film | |
dc.title | Memristive behavior of the SnO2/TiO2 interface deposited by sol–gel | en |
dc.type | Artigo | |
dspace.entity.type | Publication | |
unesp.author.lattes | 5268607684223281[4] | |
unesp.author.orcid | 0000-0003-0162-8273[4] | |
unesp.department | Física - FC | pt |
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